Search Results - "Guha, Joydeep" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

Achieving the Sustainable Development Goals (SDGs) through decentralisation and the role of local governments: a systematic review

Achieving the Sustainable Development Goals (SDGs) through decentralisation and the role of local governments: a systematic review

by Guha, Joydeep, Chakrabarti, Bhaskar
Published in Commonwealth Journal of Local Governance (01.01.2019)

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Journal Article Book Review

Making e-government work: Adopting the network approach

Making e-government work: Adopting the network approach

by Guha, Joydeep, Chakrabarti, Bhaskar
Published in Government information quarterly (01.04.2014)

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Journal Article

Achieving the Sustainable Development Goals (SDGs) through decentralisation and the role of local governments: A systematic review

Achieving the Sustainable Development Goals (SDGs) through decentralisation and the role of local governments: A systematic review

by Joydeep Guha, Bhaskar Chakrabarti
Published in Commonwealth journal of local governance (01.06.2019)

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Journal Article

DUAL CHAMBER PLASMA ETCHER WITH ION ACCELERATOR

DUAL CHAMBER PLASMA ETCHER WITH ION ACCELERATOR

by GUHA JOYDEEP
Year of Publication 21.01.2015

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Patent

METHOD OF MAKING DEVICE

METHOD OF MAKING DEVICE

by GUHA JOYDEEP
Year of Publication 26.09.2014

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Patent

PLASMA BAFFLE RING FOR A PLASMA PROCESSING APPARATUS AND METHOD OF USE

PLASMA BAFFLE RING FOR A PLASMA PROCESSING APPARATUS AND METHOD OF USE

by GUHA JOYDEEP
Year of Publication 24.02.2014

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Patent

LAYER-LAYER ETCH OF NON VOLATILE MATERIALS USING PLASMA

LAYER-LAYER ETCH OF NON VOLATILE MATERIALS USING PLASMA

by GUHA JOYDEEP
Year of Publication 11.12.2013

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Patent

SYSTEMS AND METHODS FOR SEPARATELY APPLYING CHARGED PLASMA CONSTITUENTS AND ULTRAVIOLET LIGHT IN A MIXED MODE PROCESSING OPERATION

SYSTEMS AND METHODS FOR SEPARATELY APPLYING CHARGED PLASMA CONSTITUENTS AND ULTRAVIOLET LIGHT IN A MIXED MODE PROCESSING OPERATION

by GUHA JOYDEEP, EPPLER AARON
Year of Publication 15.02.2017

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Patent

3-D PRESSURE PURGE ETCH METHOD FOR ETCHING COMPLEX 3-D STRUCTURES

3-D PRESSURE PURGE ETCH METHOD FOR ETCHING COMPLEX 3-D STRUCTURES

by GUHA JOYDEEP, PARK, PIL YEON
Year of Publication 06.02.2018

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Patent

PATTERNING OF A HARD MASK MATERIAL

PATTERNING OF A HARD MASK MATERIAL

by GUHA JOYDEEP, RUSU CAMELIA
Year of Publication 23.12.2015

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Patent

ADJUSTABLE SIDE GAS PLENUM FOR EDGE ETCH RATE CONTROL IN A DOWNSTREAM REACTOR

ADJUSTABLE SIDE GAS PLENUM FOR EDGE ETCH RATE CONTROL IN A DOWNSTREAM REACTOR

by GUHA JOYDEEP, BRAVO ANDREW STRATTON, KUMAR JATINDER
Year of Publication 21.11.2017

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Patent

SYSTEMS AND METHODS FOR ELIMINATING FLUORINE RESIDUE IN A SUBSTRATE PROCESSING CHAMBER USING A PLASMA-BASED PROCESS

SYSTEMS AND METHODS FOR ELIMINATING FLUORINE RESIDUE IN A SUBSTRATE PROCESSING CHAMBER USING A PLASMA-BASED PROCESS

by GUHA JOYDEEP, PHARKYA AMIT, BRAVO ANDREW STRATTON
Year of Publication 17.07.2017

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Patent

복잡한 다변수 웨이퍼 프로세싱 장비에서 머신 러닝을 구현하는 방법 및 프로세스

복잡한 다변수 웨이퍼 프로세싱 장비에서 머신 러닝을 구현하는 방법 및 프로세스

by GOTTSCHO RICHARD ALAN, GUHA JOYDEEP, VAHEDI VAHID, DAUGHERTY JOHN
Year of Publication 09.05.2019

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Patent

Recombination of chlorine atoms on plasma-conditioned stainless steel surfaces in the presence of adsorbed Cl2

Recombination of chlorine atoms on plasma-conditioned stainless steel surfaces in the presence of adsorbed Cl2

by Stafford, Luc, Khare, Rohit, Guha, Joydeep, Donnelly, Vincent M, Poirier, Jean-Sébastien, Margot, Joëlle
Published in Journal of physics. D, Applied physics (07.03.2009)

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Journal Article

In-Situ Surface Recombination Measurements of Oxygen Atoms on Anodized Aluminum in an Oxygen Plasma

In-Situ Surface Recombination Measurements of Oxygen Atoms on Anodized Aluminum in an Oxygen Plasma

by Guha, Joydeep, Kurunczi, Peter, Stafford, Luc, Donnelly, Vincent M, Pu, Yi-Kang
Published in Journal of physical chemistry. C (19.06.2008)

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Journal Article

Recombination of chlorine atoms on plasma-conditioned stainless steel surfaces in the presence of adsorbed Cl 2

Recombination of chlorine atoms on plasma-conditioned stainless steel surfaces in the presence of adsorbed Cl 2

by Stafford, Luc, Khare, Rohit, Guha, Joydeep, Donnelly, Vincent M, Poirier, Jean-Sébastien, Margot, Joëlle
Published in Journal of physics. D, Applied physics (07.03.2009)

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Journal Article

METHOD AND SOLUTION FOR CLEANING METAL RESIDUE

METHOD AND SOLUTION FOR CLEANING METAL RESIDUE

by GUHA JOYDEEP, KABANSKY ALEXANDER, TAN SAMANTHA S.H
Year of Publication 25.03.2015

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Patent

Experimental and modeling study of O and Cl atoms surface recombination reactions in O2 and Cl2 plasmas

Experimental and modeling study of O and Cl atoms surface recombination reactions in O2 and Cl2 plasmas

by Stafford, Luc, Guha, Joydeep, Khare, Rohit, Mattei, Stefano, Boudreault, Olivier, Clain, Boris, Donnelly, Vincent M.
Published in Pure and applied chemistry (04.05.2010)

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Journal Article

LAYER-LAYER ETCH OF NON VOLATILE MATERIALS

LAYER-LAYER ETCH OF NON VOLATILE MATERIALS

by JINNAI BUTSURIN, GUHA JOYDEEP, MARKS JEFFREY
Year of Publication 29.12.2014

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Patent

WAFERLESS AUTO CONDITIONING

WAFERLESS AUTO CONDITIONING

by JINNAI BUTSURIN, GUHA JOYDEEP, SANT SANKET
Year of Publication 13.08.2013

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Patent

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