Selection of metalorganic precursors for MOCVD of metallurgical coatings: application to Cr-based coatings
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Conference Proceeding
Platinum, Ruthenium and Ruthenium Dioxide Electrodes Deposited by Metal Organic Chemical Vapor Deposition for Oxide Applications
Baumann, P. K., Doppelt, P., Fröhlich, K., Gueroudji, L., Cambel, V., Machajdik, D., Schumacher, M., Lindner, J., Schienle, F., Burgess, D., Strauch, G., Juergensen, H., Guillon, H., Jimenez, C.
Published in Integrated ferroelectrics (01.01.2002)
Published in Integrated ferroelectrics (01.01.2002)
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A Thermodynamic Approach to the CVD of Chromium and of Chromium Carbides Starting from Cr(C6H6)2
Vahlas, Constantin, Maury, Francis, Gueroudji, Latifa
Published in Chemical vapor deposition (01.03.1998)
Published in Chemical vapor deposition (01.03.1998)
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Driving Force for Free-Carbon Incorporation in Chromium Carbide Films Processed by MOCVD
Vahlas, Constantin, Hwang, Nong Moon, Gueroudji, Latifa, Maury, Francis
Published in Chemical vapor deposition (01.05.1998)
Published in Chemical vapor deposition (01.05.1998)
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Journal Article
Driving Force for Free-Carbon Incorporation in Chromium Carbide Films Processed by MOCVD
Vahlas, Constantin, Hwang, Nong Moon, Gueroudji, Latifa, Maury, Francis
Published in Chemical vapor deposition (01.05.1998)
Published in Chemical vapor deposition (01.05.1998)
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Journal Article