Vyzkoušejte nový nástroj s podporou AI
Summon Research Assistant
BETA
Loading…
Loading…
TWO-PARAMETER OPTIMIZATION OF THE EXPERIMENTAL PLAN WHEN STUDYING THE ROUGHNESS OF THE SILICON SURFACE DURING DEEP PLASMA-CHEMICAL ETCHING OF MEMS ELEMENTS
Koshevoy, N.D., Malkova, A.V.
Published in Collection of scientific works of the Military Institute of Kyiv National Taras Shevchenko University (2021)
Published in Collection of scientific works of the Military Institute of Kyiv National Taras Shevchenko University (2021)
Get full text
Journal Article