A novel approach for the patterning and high-volume production of sub-40-nm gates
Romero, K., Stephan, R., Grasshoff, G., Mazur, M., Ruelke, H., Huy, K., Klais, J., McGowan, S., Dakshina-Murthy, S., Bell, S., Wright, M.
Published in IEEE transactions on semiconductor manufacturing (01.11.2005)
Published in IEEE transactions on semiconductor manufacturing (01.11.2005)
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