Growth Kinetics of Low Pressure Chemically Vapour Deposited Selective Tungsten Films in WF sub 6 --Si and WF sub 6 --H sub 2 Systems
Turtsevich, A S, Krasnitsky, V Y, Granko, V I, Lesnikova, V P, Smal, I V, Sarychev, O E, Nalivaiko, O Y, Kravtsov, S V
Published in Thin solid films (10.12.1992)
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Published in Thin solid films (10.12.1992)
Journal Article
Growth kinetics of low pressure chemically vapour deposited selective tungsten films in WF6-Si and WF6-H2 systems
TURTSEVICH, A. S, KRASNITSKY, V. Y, GRANKO, V. I, LESNIKOVA, V. P, SMAL, I. V, SARYCHEV, O. E, NALIVAIKO, O. Y, KRAVTSOV, S. V
Published in Thin solid films (10.12.1992)
Published in Thin solid films (10.12.1992)
Get full text
Journal Article
Growth kinetics of low pressure chemically vapour deposited selective tungsten films in WF sub(6)-Si and WF sub(6)-H sub(2) systems
Turtsevich, A S, Krasnitsky, VY, Granko, VI, Lesnikova, V P, Smal, I V, Sarychev, O E, Nalivaiko, O Y, Kravtsov, S V
Published in Thin solid films (01.01.1992)
Get full text
Published in Thin solid films (01.01.1992)
Journal Article