Synthesis of the ABCDEF-ring of ciguatoxin 3C
Sato, Takuto, Fujiwara, Kenshu, Nogoshi, Keisuke, Goto, Akiyoshi, Domon, Daisuke, Kawamura, Natsumi, Nomura, Yoshitaka, Sato, Daisuke, Tanaka, Hideki, Murai, Akio, Kondo, Yoshihiko, Akiba, Uichi, Katoono, Ryo, Kawai, Hidetoshi, Suzuki, Takanori
Published in Tetrahedron (09.02.2017)
Published in Tetrahedron (09.02.2017)
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Journal Article
Challenges and Progress in Defectivity for Advanced ArF Lithography Process
Tango, Naohiro, Yamamoto, Kei, Shirakawa, Michihiro, Ou, Keiyu, Goto, Akiyoshi, Fujita, Mitsuhiro, Shiraishi, Yasuharu, Fujimori, Toru
Published in Journal of Photopolymer Science and Technology (24.06.2019)
Published in Journal of Photopolymer Science and Technology (24.06.2019)
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Journal Article
Challenges and Progress in Low Defectivity for advanced ArF Lithography Processes using Surface Localized Material Technology
Shirakawa, Michihiro, Fujimori, Toru, Tango, Naohiro, Marumo, Kazuhiro, Yamamoto, Kei, Takahashi, Hidenori, Nishio, Ryo, Goto, Akiyoshi, Fujita, Mitsuhiro
Published in Journal of Photopolymer Science and Technology (01.01.2017)
Published in Journal of Photopolymer Science and Technology (01.01.2017)
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Stereoselective synthesis of cis- and trans-2,3-disubstituted eight-membered medium-ring ethers based on Ireland–Claisen rearrangement of 3-alkoxy-2-propenyl glycolate esters and ring-closing olefin metathesis
Fujiwara, Kenshu, Goto, Akiyoshi, Sato, Daisuke, Kawai, Hidetoshi, Suzuki, Takanori
Published in Tetrahedron letters (16.05.2005)
Published in Tetrahedron letters (16.05.2005)
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Journal Article
Convergent synthesis of the ABCDE-ring part of ciguatoxin CTX3C
Fujiwara, Kenshu, Goto, Akiyoshi, Sato, Daisuke, Ohtaniuchi, Yuko, Tanaka, Hideki, Murai, Akio, Kawai, Hidetoshi, Suzuki, Takanori
Published in Tetrahedron letters (13.09.2004)
Published in Tetrahedron letters (13.09.2004)
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METHOD FOR PRODUCING ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING ONIUM SALT COMPOUND FOR ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ONIUM SALT COMPOSITION
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Patent
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, RESIN, AND METHOD FOR PRODUCING RESIN
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Patent