Interface and material characterization of thin Al2O3 layers deposited by ALD using TMA/H2O
Gosset, L.G., Damlencourt, J.-F., Renault, O., Rouchon, D., Holliger, Ph, Ermolieff, A., Trimaille, I., Ganem, J.-J., Martin, F., Séméria, M.-N.
Published in Journal of non-crystalline solids (01.05.2002)
Published in Journal of non-crystalline solids (01.05.2002)
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Conference Proceeding
Influence of SiH4 process step on physical and electrical properties of advanced copper interconnects
Chhun, S., Gosset, L.G., Casanova, N., Guillaumond, J.F., Dumont-Girard, P., Federspiel, X., Pantel, R., Arnal, V., Arnaud, L., Torres, J.
Published in Microelectronic engineering (01.10.2004)
Published in Microelectronic engineering (01.10.2004)
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Conference Proceeding
Optimization of signal propagation performances in interconnects of the 45 nm node by exhaustive analysis of the technological parameters impact
Farcy, A., Cueto, O., Blampey, B., Arnal, V., Gosset, L.G., Besling, W.F.A., Chhun, S., Lacrevaz, T., Bermond, C., Flechet, B., Rousire, O., de Crecy, F., Angenieux, G., Torres, J.
Published in Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005 (2005)
Published in Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005 (2005)
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Conference Proceeding
Advanced Cu interconnects using air gaps
Gosset, L.G., Farcy, A., de Pontcharra, J., Lyan, Ph, Daamen, R., Verheijden, G.J.A.M., Arnal, V., Gaillard, F., Bouchu, D., Bancken, P.H.L., Vandeweyer, T., Michelon, J., Hoang, V. Nguyen, Hoofman, R.J.O.M., Torres, J.
Published in Microelectronic engineering (01.12.2005)
Published in Microelectronic engineering (01.12.2005)
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Conference Proceeding
Chemical etching solutions for air gap formation using a sacrificial oxide/polymer approach
Gaillard, F., de Pontcharra, J., Gosset, L.G., Lyan, Ph, Bouchu, D., Daamen, R., Louveau, O., Besson, P., Passemard, G., Torres, J.
Published in Microelectronic engineering (01.11.2006)
Published in Microelectronic engineering (01.11.2006)
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Conference Proceeding
Characterization and integration of a CVD porous SiOCH (k<2.5) with enhanced mechanical properties for 65 nm CMOS interconnects and below
Chapelon, L.L., Arnal, V., Broekaart, M., Gosset, L.G., Vitiello, J., Torres, J.
Published in Microelectronic engineering (01.10.2004)
Published in Microelectronic engineering (01.10.2004)
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Conference Proceeding
New techniques to characterize properties of advanced dielectric barriers for sub-65 nm technology node
Vitiello, J., Ducote, V., Farcy, A., Gosset, L.G., Le-Friec, Y., Hopstaken, M., Jullian, S., Cordeau, M., Ailhas, C., Chapelon, L.L., Barbier, D., Veillerot, M., Danel, A., Torres, J.
Published in Microelectronic engineering (01.11.2006)
Published in Microelectronic engineering (01.11.2006)
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Conference Proceeding
Impact of introducing CuSiN self-aligned barriers in advanced copper interconnects
Chhun, S., Gosset, L.G., Casanova, N., Ney, D., Delille, D., Trouiller, C., Hopstaken, M., Chausse, P., Grégoire, M., Gautier, B., Dupuy, J.-C., Torres, J.
Published in Microelectronic engineering (01.12.2005)
Published in Microelectronic engineering (01.12.2005)
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Journal Article
Conference Proceeding
Cu surface treatment influence on Si adsorption properties of CuSiN self-aligned barriers for sub-65 nm technology node
Chhun, S., Gosset, L.G., Michelon, J., Girault, V., Vitiello, J., Hopstaken, M., Courtas, S., Debauche, C., Bancken, P.H.L., Gaillard, N., Bryce, G., Juhel, M., Pinzelli, L., Guillan, J., Gras, R., Van Schravendijk, B., Dupuy, J.-C., Torres, J.
Published in Microelectronic engineering (01.11.2006)
Published in Microelectronic engineering (01.11.2006)
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Conference Proceeding
Hybrid punch through approach to address electroless related integration issues of hybrid CoWP/SiCN barriers
Guillan, J., Gosset, L.G., Delsol, R., Ollier, E., Brun, Ph, Petitprez, E., Gras, R., Girault, V., Gall, M., Hauschildt, M., Torres, J.
Published in Microelectronic engineering (01.11.2007)
Published in Microelectronic engineering (01.11.2007)
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Journal Article
Conference Proceeding
New techniques to characterize properties of advanced dielectric barriers for sub-65nm technology node
Vitiello, J., Ducote, V., Farcy, A., Gosset, L.G., Le-Friec, Y., Hopstaken, M., Jullian, S., Cordeau, M., Ailhas, C., Chapelon, L.L., Barbier, D., Veillerot, M., Danel, A., Torres, J.
Published in Microelectronic engineering (01.11.2006)
Published in Microelectronic engineering (01.11.2006)
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Journal Article
Cu surface treatment influence on Si adsorption properties of CuSiN self-aligned barriers for sub-65nm technology node
Chhun, S., Gosset, L.G., Michelon, J., Girault, V., Vitiello, J., Hopstaken, M., Courtas, S., Debauche, C., Bancken, P.H.L., Gaillard, N., Bryce, G., Juhel, M., Pinzelli, L., Guillan, J., Gras, R., Van Schravendijk, B., Dupuy, J.-C., Torres, J.
Published in Microelectronic engineering (01.11.2006)
Published in Microelectronic engineering (01.11.2006)
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Journal Article
Integration and characterization of gas cluster processing for copper interconnects electromigration improvement
Gras, R., Gosset, L.G., Petitprez, E., Girault, V., Hopstaken, M., Jullian, S., Imbert, G., Le Friec, Y., Bienacel, J., Guillan, J., Chevolleau, T., Sherman, S., Tabat, M., Hautala, J., Torres, J.
Published in Microelectronic engineering (01.11.2007)
Published in Microelectronic engineering (01.11.2007)
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Conference Proceeding
Integration of gas cluster process for copper interconnects reliability improvement and process impact evaluation on BEOL dielectric materials
Gras, R., Gosset, L.G., Hopstaken, M., Bouyssou, R., Chevolleau, T., Petitprez, E., Girault, V., Jullian, S., Guillan, J., Imbert, G., Fossati, D., Le Friec, Y., Torres, J.
Published in Microelectronic engineering (01.09.2007)
Published in Microelectronic engineering (01.09.2007)
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Conference Proceeding
Integration of SiOC air gaps in copper interconnects
Gosset, L.G, Arnal, V, Brun, Ph, Broekaart, M, Monget, C, Casanova, N, Rivoire, M, Oberlin, J.-C, Torres, J
Published in Microelectronic engineering (01.11.2003)
Published in Microelectronic engineering (01.11.2003)
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Conference Proceeding
Loss of oxygen at the Si-SiO2 interface during dry oxidation of silicon
AKERMARK, A, GOSSET, L. G, GANEM, J.-J, TRIMAILLE, I, RIGO, S
Published in Journal of the Electrochemical Society (01.09.1999)
Published in Journal of the Electrochemical Society (01.09.1999)
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Narrow nuclear resonance position or cross section shape measurements with a high precision computer controlled beam energy scanning system
Amsel, G., d'Artemare, E., Battistig, G., Girard, E., Gosset, L.G., Révész, P.
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.03.1998)
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.03.1998)
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Journal Article
High resolution depth profiling in silicon oxynitride films using narrow nuclear reaction resonances
Gosset, L.G., Ganem, J.-J., Trimaille, I., Rigo, S., Rochet, F., Dufour, G., Jolly, F., Stedile, F.C., Baumvol, I.J.R.
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.03.1998)
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.03.1998)
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Journal Article
Electron paramagnetic resonance spectra of interface defects in nitric oxide treated Si/SiO2
VON BARDELEBEN, H. J, CANTIN, J. L, GOSSET, L. G, GANEM, J. J, TRIMAILLE, I, RIGO, S
Published in Journal of non-crystalline solids (01.04.1999)
Published in Journal of non-crystalline solids (01.04.1999)
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