Chemical effects in chemical mechanical planarization of TaN: investigation of surface reactions in a peroxide-based alkaline slurry using Fourier transform impedance spectroscopy
Gorantla, V.R.K., Emery, S.B., Pandija, S., Babu, S.V., Roy, D.
Published in Materials letters (01.03.2005)
Published in Materials letters (01.03.2005)
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Journal Article
Electrochemical impedance characteristics of Ta/Cu contact regions in polishing slurries used for chemical mechanical planarization of Ta and Cu: considerations of galvanic corrosion
Assiongbon, K.A., Emery, S.B., Gorantla, V.R.K., Babu, S.V., Roy, D.
Published in Corrosion science (01.02.2006)
Published in Corrosion science (01.02.2006)
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Journal Article