구리 및 루테늄을 함유하는 기판의 화학적 기계적 폴리싱
GOLZARIAN REZA M, WEI TE YU, CHIU WEI LAN, PROELSS JULIAN, LEUNISSEN LEONARDUS, GUEVENC HACI OSMAN, LAUTER MICHAEL
Year of Publication 20.08.2021
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Year of Publication 20.08.2021
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구리 및 루테늄을 함유하는 기판의 화학적 기계적 폴리싱
GOLZARIAN REZA M, WEI TE YU, CHIU WEI LAN, PROELSS JULIAN, LEUNISSEN LEONARDUS, GUEVENC HACI OSMAN, LAUTER MICHAEL
Year of Publication 20.08.2021
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Year of Publication 20.08.2021
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구리 및 루테늄을 포함하는 기판의 화학적 기계적 폴리싱
GOLZARIAN REZA M, WEI TE YU, DAESCHLEIN CHRISTIAN, PROELSS JULIAN, LEUNISSEN LEONARDUS, GUEVENC HACI OSMAN, LAUTER MICHAEL
Year of Publication 20.08.2021
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Year of Publication 20.08.2021
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코발트 및/또는 코발트 합금 포함 기판의 폴리싱을 위한 화학 기계적 폴리싱 (CMP) 조성물의 용도
SIEBERT MAX, GOLZARIAN REZA M, USMAN IBRAHIM SHEIK ANSAR, REICHARDT ROBERT, LAN YONGQING, PROELSS JULIAN, LEUNISSEN LEONARDUS, LAUTER MICHAEL, GUEVENC HACI OSMAN
Year of Publication 19.12.2018
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Year of Publication 19.12.2018
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코발트 및/또는 코발트 합금 포함 기판의 폴리싱을 위한 화학 기계적 폴리싱 (CMP) 조성물의 용도
SIEBERT MAX, GOLZARIAN REZA M, USMAN IBRAHIM SHEIK ANSAR, WEI TE YU, LAN YONGQING, LAUTER MICHAEL, GUEVENC HACI OSMAN
Year of Publication 26.11.2018
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Year of Publication 26.11.2018
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코발트 함유 기판의 연마를 위한 화학 기계 연마 (CMP) 조성물의 용도
SIEBERT MAX, GOLZARIAN REZA M, USMAN IBRAHIM SHEIK ANSAR, WEI TE YU, REICHARDT ROBERT, LAN YONGQING, PROELSS JULIAN, LEUNISSEN LEONARDUS, LAUTER MICHAEL, GUEVENC HACI OSMAN
Year of Publication 18.04.2018
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Year of Publication 18.04.2018
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CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND RUTHENIUM
Lauter, Michael, Chiu, Wei Lan, Leunissen, Leonardus, Proelss, Julian, Wei, Te Yu, Guevenc, Haci Osman, Golzarian, Reza M
Year of Publication 04.01.2024
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Year of Publication 04.01.2024
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CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND RUTHENIUM
Lauter, Michael, Chiu, Wei Lan, Leunissen, Leonardus, Proelss, Julian, GUEVENC, Haci Osman, Wei, Te Yu, Golzarian, Reza M
Year of Publication 28.12.2023
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Year of Publication 28.12.2023
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Chemical mechanical polishing of substrates containing copper and ruthenium
Lauter, Michael, Chiu, Wei Lan, Leunissen, Leonardus, Proelss, Julian, Wei, Te Yu, Guevenc, Haci Osman, Golzarian, Reza M
Year of Publication 15.08.2023
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Year of Publication 15.08.2023
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Chemical mechanical polishing composition
Lauter, Michael, Usman Ibrahim, Sheik Ansar, Leunissen, Leonardus, Proelss, Julian, Lan, Yongqing, Wei, Te Yu, Golzarian, Reza M, Guevenc, Haci Osman, Siebert, Max, Daeschlein, Christian
Year of Publication 28.05.2024
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Year of Publication 28.05.2024
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CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND RUTHENIUM
LEUTER, Michael, GOLZARIAN, Reza M, GUEVENC, Haci Osman, CHIU, Wei Lan, PROELSS, Julian, LEUNISSEN, Leonardus, Taoyuan, WEI
Year of Publication 03.03.2022
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Year of Publication 03.03.2022
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CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND RUTHENIUM
LAUTER, Michael, GOLZARIAN, Reza M, GUEVENC, Haci Osman, WEI, Te Yu, CHIU, Wei Lan, PROELSS, Julian, LEUNISSEN, Leonardus
Year of Publication 24.02.2022
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Year of Publication 24.02.2022
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CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND RUTHENIUM
LAUTER, Michael, GOLZARIAN, Reza M, GUEVENC, Haci Osman, WEI, Te Yu, CHIU, Wei Lan, PROELSS, Julian, LEUNISSEN, Leonardus
Year of Publication 17.02.2022
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Year of Publication 17.02.2022
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CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND RUTHENIUM
LAUTER, Michael, GOLZARIAN, Reza M, GUEVENC, Haci Osman, WEI, Te Yu, CHIU, Wei Lan, PROELSS, Julian, LEUNISSEN, Leonardus
Year of Publication 20.10.2021
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Year of Publication 20.10.2021
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Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
Lauter, Michael, Usman Ibrahim, Sheik Ansar, Leunissen, Leonardus, Reichardt, Robert, Proelss, Julian, Lan, Yongqing, Golzarian, Reza M, Guevenc, Haci Osman, Siebert, Max
Year of Publication 01.03.2022
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Year of Publication 01.03.2022
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USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISHING OF COBALT AND / OR COBALT ALLOY COMPRISING SUBSTRATES
LAUTER, Michael, GOLZARIAN, Reza M, GUEVENC, Haci Osman, WEI, Te Yu, LAN, Yongqing, SIEBERT, Max, USMAN IBRAHIM, Sheik Ansar
Year of Publication 20.05.2020
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Year of Publication 20.05.2020
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USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISHING OF COBALT COMPRISING SUBSTRATES
LAUTER, Michael, REICHARDT, Robert, GOLZARIAN, Reza M, USMAN IBRAHIM, Sheik, WEI, Te Yu, GUEVENC, Haci Osman, LAN, Yongqing, PROELSS, Julian, SIEBERT, Max, LEUNISSEN, Leonardus
Year of Publication 08.04.2021
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Year of Publication 08.04.2021
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Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates
Lauter, Michael, Usman Ibrahim, Sheik Ansar, Leunissen, Leonardus, Reichardt, Robert, Proelss, Julian, Lan, Yongqing, Wei, Te Yu, Golzarian, Reza M, Guevenc, Haci Osman, Siebert, Max
Year of Publication 26.01.2021
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Year of Publication 26.01.2021
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