e-beam metrology of thin resist for high NA EUVL
Lorusso, Gian Francesco, De Simone, Danilo, Zidan, Mohamed, Severi, Joren, Moussa, Alain, Dey, Bappaditya, Halder, Sandip, Goldenshtein, Alex, Houchens, Kevin, Santoro, Gaetano, Fischer, Daniel, Muellender, Angelika, Mack, Chris, Kondo, Tsuyoshi, Shohjoh, Tomoyasu, Ikota, Masami, Charley, Anne-Laure, De Gendt, Stefan, Leray, Philippe
Published in Japanese Journal of Applied Physics (01.06.2023)
Published in Japanese Journal of Applied Physics (01.06.2023)
Get full text
Journal Article
Inspection of a lithographic mask that is protected by a pellicle
Dodzin, Nir Ben-David, Litman, Alon, Karabekov, Albert, Goldenshtein, Alex
Year of Publication 18.12.2018
Get full text
Year of Publication 18.12.2018
Patent
INSPECTION OF A LITHOGRAPHIC MASK THAT IS PROTECTED BY A PELLICLE
Karabekov Albert, Litman Alon, Goldenshtein Alex, Dodzin Nir Ben-David
Year of Publication 29.09.2016
Get full text
Year of Publication 29.09.2016
Patent
Inspection of a lithographic mask that is protected by a pellicle
LITMAN ALON, GOLDENSHTEIN ALEX, KARABEKOV ALBERT, DODZIN NIR BEN-DAVID
Year of Publication 14.06.2016
Get full text
Year of Publication 14.06.2016
Patent
INSPECTION OF A LITHOGRAPHIC MASK THAT IS PROTECTED BY A PELLICLE
LITMAN ALON, GOLDENSHTEIN ALEX, KARABEKOV ALBERT, DODZIN NIR BEN-DAVID
Year of Publication 29.01.2015
Get full text
Year of Publication 29.01.2015
Patent