Introducing 157 nm Full Field Lithography
Goethals, A.M., Bisschop, P. De, Hermans, J., Jonckheere, R., Roey, F. Van, Heuvel, D. Van den, Eliat, A., Ronse, K.
Published in Journal of Photopolymer Science and Technology (2003)
Published in Journal of Photopolymer Science and Technology (2003)
Get full text
Journal Article
Recent Progress in ArF Lithography for the 1OOnm Node
Goethals, A.M., Vandenberghe, G., Pollentier, I., Ercken, M., Bisschop, P. de, Maenhoudt, M., Ronse, K.
Published in Journal of Photopolymer Science and Technology (30.05.2001)
Published in Journal of Photopolymer Science and Technology (30.05.2001)
Get full text
Journal Article
Recent advancements in 193 nm step and scan lithography
Goethals, A.M., Jaenen, P., Pollers, I., Roey, F. van, Ronse, K., Heskamp, B., Davies, G.
Published in Journal of photopolymer science and technology (1999)
Published in Journal of photopolymer science and technology (1999)
Get full text
Journal Article
Recent advancements in 193nm step and scan lithography
Goethals, A.M., Jaenen, P., Pollers, I., Roey, F. van, Ronse, K., Heskamp, B., Davies, G.
Published in Journal of Photopolymer Science and Technology (30.05.1999)
Published in Journal of Photopolymer Science and Technology (30.05.1999)
Get full text
Journal Article
Lithographic performance of 193 nm single and bi-layer materials
Goethals, A.M., Pollers, I., Roey, F. van, Sugihara, T., Ronse, K., Driessche, V. van, Tzviatkov, P., Medina, A., Gabor, A., Blakeney, A., Steinhausler, T., Biafore, J., Slater, S., Nalamasu, O., Houlihan, F., Kometani, J., Timko, A., Cirelli, R.
Published in Journal of photopolymer science and technology (1998)
Published in Journal of photopolymer science and technology (1998)
Get full text
Journal Article
Lithographic performance of 193nm single and bi-layer materials
Goethals, A.M., Pollers, I., Roey, F. van, Sugihara, T., Ronse, K., Driessche, V. van, Tzviatkov, P., Medina, A., Gabor, A., Blakeney, A., Steinhausler, T., Biafore, J., Slater, S., Nalamasu, O., Houlihan, F., Kometani, J., Timko, A., Cirelli, R.
Published in Journal of Photopolymer Science and Technology (1998)
Published in Journal of Photopolymer Science and Technology (1998)
Get full text
Journal Article
Status and critical challenges for 157-nm lithography
Ronse, K., De Bisschop, P., Goethals, A.M., Hermans, J., Jonckheere, R., Light, S., Okoroanyanwu, U., Watso, R., McAfferty, D., Ivaldi, J., Oneil, T., Sewell, H.
Published in Microelectronic engineering (01.06.2004)
Published in Microelectronic engineering (01.06.2004)
Get full text
Journal Article
Resist surface investigations for reduction of Line-Edge-Roughness in Top Surface Imaging technology
Sugihara, T., Van Roey, F., Goethals, A.M., Ronse, K., Van den hove, L.
Published in Microelectronic engineering (1999)
Published in Microelectronic engineering (1999)
Get full text
Journal Article
Conference Proceeding
Stability of silylated images for application to dry developable deep-UV lithography
Goethals, A.M., Baik, K.H., Ronse, K., Van den hove, L., Roland, B.
Published in Microelectronic engineering (01.04.1993)
Published in Microelectronic engineering (01.04.1993)
Get full text
Journal Article
Sub-quarter micron phase shifting lithography using the desire process at 248 nm (deep UV)
Ronse, K., Jonckheere, R., Goethals, A.M., Baik, K.H., Van den hove, L.
Published in Microelectronic engineering (01.03.1992)
Published in Microelectronic engineering (01.03.1992)
Get full text
Journal Article
A DUV focus/exposure latitude study based on various partial coherences with different types of processes
Han, Woo-Sung, Goethals, A.M., Baik, K.H., Van den hove, L.
Published in Microelectronic engineering (01.03.1992)
Published in Microelectronic engineering (01.03.1992)
Get full text
Journal Article
An in-depth study of the influence of silylation conditions on the silicon contrast
Goethals, A.M., Lombaerts, R., Roland, B., Van de hove, L.
Published in Microelectronic engineering (01.01.1991)
Published in Microelectronic engineering (01.01.1991)
Get full text
Journal Article
Implementation of desire in a 0.5 μm NMOS process
Nichols, D.N., Goethals, A.M., De Geyter, P., Van den hove, L.
Published in Microelectronic engineering (1990)
Published in Microelectronic engineering (1990)
Get full text
Journal Article
Conference Proceeding
Optimisation of a pure oxygen, two step dry development technique for the desire process
Lombaerts, R., Roland, B., Selino, A., Goethals, A.M., Van Den Hove, L.
Published in Microelectronic engineering (1990)
Published in Microelectronic engineering (1990)
Get full text
Journal Article
Conference Proceeding
Full-field EUV and immersion lithography integration in 0.186μm2 FinFET 6T-SRAM cell
Veloso, A., Demuynck, S., Ercken, M., Goethals, A.M., Demand, M., de Marneffe, J.-F., Altamirano, E., De Keersgieter, A., Delvaux, C., De Backer, J., Brus, S., Hermans, J., Baudemprez, B., Van Roey, F., Lorusso, G.F., Baerts, C., Goossens, D., Vrancken, C., Mertens, S., Versluijs, J.J., Truffert, V., Huffman, C., Laidler, D., Heylen, N., Ong, P., Parvais, B., Rakowski, M., Verhaegen, S., Hikavyy, A., Meiling, H., Hultermans, B., Romijn, L., Pigneret, C., Lok, S., Van Dijk, A., Shah, K., Noori, A., Gelatos, J., Arghavani, R., Schreutelkamp, R., Boelen, P., Richard, O., Bender, H., Witters, L., Collaert, N., Rooyackers, R., Absil, P., Lauwers, A., Jurczak, M., Hoffmann, T., Vanhaelemeersch, S., Cartuyvels, R., Ronse, K., Biesemans, S.
Published in 2008 IEEE International Electron Devices Meeting (01.12.2008)
Published in 2008 IEEE International Electron Devices Meeting (01.12.2008)
Get full text
Conference Proceeding
Demonstration of scaled 0.099µm2 FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
Veloso, A., Demuynck, S., Ercken, M., Goethals, A.M., Locorotondo, S., Lazzarino, F., Altamirano, E., Huffman, C., De Keersgieter, A., Brus, S., Demand, M., Struyf, H., De Backer, J., Hermans, J., Delvaux, C., Baudemprez, B., Vandeweyer, T., Van Roey, F., Baerts, C., Goossens, D., Dekkers, H., Ong, P., Heylen, N., Kellens, K., Volders, H., Hikavyy, A., Vrancken, C., Rakowski, M., Verhaegen, S., Dusa, M., Romijn, L., Pigneret, C., Van Dijk, A., Schreutelkamp, R., Cockburn, A., Gravey, V., Meiling, H., Hultermans, B., Lok, S., Shah, K., Rajagopalan, R., Gelatos, J., Richard, O., Bender, H., Vandenberghe, G., Beyer, G.P., Absil, P., Hoffmann, T., Ronse, K., Biesemans, S.
Published in 2009 IEEE International Electron Devices Meeting (IEDM) (01.12.2009)
Published in 2009 IEEE International Electron Devices Meeting (IEDM) (01.12.2009)
Get full text
Conference Proceeding
Lithography for sub-90nm applications
Van den Hove, L., Goethals, A.M., Ronse, K., Van Bavel, M., Vandenberghe, G.
Published in Digest. International Electron Devices Meeting (2002)
Published in Digest. International Electron Devices Meeting (2002)
Get full text
Conference Proceeding