Lithography Options for the 32 nm Half Pitch Node and Beyond
Ronse, K., Jansen, P., Gronheid, R., Hendrickx, E., Maenhoudt, M., Wiaux, V., Goethals, A.-M., Jonckheere, R., Vandenberghe, G.
Published in IEEE transactions on circuits and systems. I, Regular papers (01.08.2009)
Published in IEEE transactions on circuits and systems. I, Regular papers (01.08.2009)
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Journal Article
Progress in EUV Resist Performance
Goethals, A. M., Gronheid, R., Roey, F. Van, Solak, H. H., Ekinci, Y.
Published in Journal of Photopolymer Science and Technology (01.01.2006)
Published in Journal of Photopolymer Science and Technology (01.01.2006)
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Journal Article
EUV Resist Screening: Current Performance and Issues
Goethals, A. M., Gronheld, R., Leumissen, L. H. A., Roey, F. Van, Solak, H. H.
Published in Journal of Photopolymer Science and Technology (2005)
Published in Journal of Photopolymer Science and Technology (2005)
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Journal Article
Resist surface investigations for reduction of Line-Edge-Roughness in Top Surface Imaging technology
Sugihara, T., Van Roey, F., Goethals, A.M., Ronse, K., Van den hove, L.
Published in Microelectronic engineering (1999)
Published in Microelectronic engineering (1999)
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Journal Article
Conference Proceeding
Dual Control of Relaxation: Its Role in the Ventricular Function in the Mammalian Heart
BRUTSAERT, DIRK L, HOUSMANS, PHILIPPE R, GOETHALS, MARC A
Published in Circulation research (01.11.1980)
Published in Circulation research (01.11.1980)
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Journal Article
Relaxation of ventricular cardiac muscle
Brutsaert, D.L, Clerck, N.M. de, Goethals, M.A, Housmans, P.R
Published in The Journal of physiology (01.10.1978)
Published in The Journal of physiology (01.10.1978)
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Journal Article
Status of EUV Lithography at IMEC
Goethal, A. M., Jockheere, R., Lurusso, C. F., Hermans, J., Roey, F. Van, Myers, A., Niroomand, A., Kim, I., Iwamoto, F., Stepenenko, N., Ronse, K.
Published in Journal of Photopolymer Science and Technology (01.01.2007)
Published in Journal of Photopolymer Science and Technology (01.01.2007)
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Journal Article
Status and critical challenges for 157-nm lithography
RONSE, K, DE BISSCHOP, P, ONEIL, T, SEWELL, H, GOETHALS, A. M, HERMANS, J, JONCKHEERE, R, LIGHT, S, OKOROANYANWU, U, WATSO, R, MCAFFERTY, D, IVALDI, J
Published in Microelectronic engineering (01.06.2004)
Published in Microelectronic engineering (01.06.2004)
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Conference Proceeding
Journal Article
Optimisation of a pure oxygen, two step dry development technique for the desire process
Lombaerts, R., Roland, B., Selino, A., Goethals, A.M., Van Den Hove, L.
Published in Microelectronic engineering (1990)
Published in Microelectronic engineering (1990)
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Journal Article
Conference Proceeding
Load-Insensitive Relaxation Caused by Hypoxia in Mammalian Cardiac Muscle
CHUCK, LEONARD H.S, GOETHALS, MARK A, PARMLEY, WILLIAM W, BRUTSAERT, DIRK L
Published in Circulation research (01.06.1981)
Published in Circulation research (01.06.1981)
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Journal Article
Status and critical challenges for 157-nm lithography
Ronse, K., De Bisschop, P., Goethals, A.M., Hermans, J., Jonckheere, R., Light, S., Okoroanyanwu, U., Watso, R., McAfferty, D., Ivaldi, J., Oneil, T., Sewell, H.
Published in Microelectronic engineering (01.06.2004)
Published in Microelectronic engineering (01.06.2004)
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Journal Article
An in-depth study of the influence of silylation conditions on the silicon contrast
Goethals, A.M., Lombaerts, R., Roland, B., Van de hove, L.
Published in Microelectronic engineering (01.01.1991)
Published in Microelectronic engineering (01.01.1991)
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Journal Article
Loading determinants of relaxation in cat papillary muscle
Goethals, M A, Housmans, P R, Brutsaert, D L
Published in The American journal of physiology (01.03.1982)
Published in The American journal of physiology (01.03.1982)
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Journal Article