Monte Carlo simulation of ions in a magnetron plasma
Goeckner, M.J., Goree, J.A., Sheridan, T.E.
Published in IEEE transactions on plasma science (01.04.1991)
Published in IEEE transactions on plasma science (01.04.1991)
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Journal Article
Electronegative Plasma Structure
Goeckner, M.J., Nelson, C.T., Overzet, L.J.
Published in IEEE transactions on plasma science (01.08.2008)
Published in IEEE transactions on plasma science (01.08.2008)
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Journal Article
Electron confinement on magnetic field lines
Goeckner, M.J., Earle, G.D., Overzet, L.J., Maynard, J.C.
Published in IEEE transactions on plasma science (01.04.2005)
Published in IEEE transactions on plasma science (01.04.2005)
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Journal Article
Plasma-neutral interaction in thermally collapsed plasma
Park, Jaeyoung, Bennett, T.K., Goeckner, M.J., Cohen, S.A.
Published in Journal of nuclear materials (01.01.1997)
Published in Journal of nuclear materials (01.01.1997)
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Journal Article
FTIR spectroscopy Measurements 0f CF/sub 4/ and C/sub 2/ F/sub 6/ concentrations In a planar rf Inductively-coupled Plasma
Mahoney, L.J., Yulke, S.G., Shohet, J.L., Goeckner, M.J.
Published in Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) (1994)
Published in Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) (1994)
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Conference Proceeding
Evaluation of charging damage in a plasma doping system
Goeckner, M.J., Felch, S.B., Fang, Z., Weeman, J.
Published in 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) (1999)
Published in 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395) (1999)
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Conference Proceeding
Evaluation of tests to examine charging damage in ion implantation and plasma processes: using controlled stress environments
Goeckner, M.J., Felch, S.B., Weeman, J., Erhardt, J.
Published in 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) (2000)
Published in 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) (2000)
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Conference Proceeding
Buried Ceramic Layer Formation In Glass And Silicon Using Plasma Source Ion Implantation
Booske, J.H., Zhan, L., Cooper, R.F., Shohet, J.L., Shenai, K., Dallman, D., Goeckner, M.J., Breun, R., Hitchon, W.N.G., Wickesberg, E., Speth, R., Jacobs, J.R., Was, G.
Published in Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) (1994)
Published in Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) (1994)
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Conference Proceeding
Reduction Of Residual Charge In Surface-neutralization-based Neutral Beams
Goeckner, M.J., Bennett, T.K., Jaeyoung Park, Wang, Z., Cohen, S.A.
Published in 2nd International Symposium on Plasma Process-Induced Damage (1997)
Published in 2nd International Symposium on Plasma Process-Induced Damage (1997)
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Conference Proceeding
Sputtering magnetron experiments and modeling
Goree, J., Goeckner, M.J., Sheridan, T.E.
Published in 1990 Plasma Science IEEE Conference Record - Abstracts (1990)
Published in 1990 Plasma Science IEEE Conference Record - Abstracts (1990)
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Conference Proceeding