A study of mixtures of HfO2 and TiO2 as high-k gate dielectrics
CHEN, F, BIN, X, HELLA, C, SHI, X, GLADFELTER, W. L, CAMPBELL, S. A
Published in Microelectronic engineering (01.04.2004)
Published in Microelectronic engineering (01.04.2004)
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Journal Article
Group IVB metal oxides high permittivity gate insulators deposited from anhydrous metal nitrates
Tiezhong Ma, Campbell, S.A., Smith, R., Hoilien, N., Boyong He, Gladfelter, W.L., Hobbs, C., Buchanan, D., Taylor, C., Gribelyuk, M., Tiner, M., Coppel, M., Jang Jung Lee
Published in IEEE transactions on electron devices (01.10.2001)
Published in IEEE transactions on electron devices (01.10.2001)
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Journal Article
High mobility HfO2 n- and p-channel transistors
CAMPBELL, S. A, MA, T. Z, SMITH, R, GLADFELTER, W. L, CHEN, F
Published in Microelectronic engineering (01.11.2001)
Published in Microelectronic engineering (01.11.2001)
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Combinatorial CVD of Zirconium, Hafnium, and Tin Oxide Mixtures for Applications as High-κ Materials
Xia, B., Chen, F., Campbell, S.A., Roberts, J.T., Gladfelter, W.L.
Published in Chemical vapor deposition (01.08.2004)
Published in Chemical vapor deposition (01.08.2004)
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Journal Article
A study of mixtures of HfO 2 and TiO 2 as high- k gate dielectrics
Chen, F., Bin, X., Hella, C., Shi, X., Gladfelter, W.L., Campbell, S.A.
Published in Microelectronic engineering (2004)
Published in Microelectronic engineering (2004)
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Journal Article
High mobility HfO 2 n- and p-channel transistors
Campbell, S.A, Ma, T.Z, Smith, R, Gladfelter, W.L, Chen, F
Published in Microelectronic engineering (2001)
Published in Microelectronic engineering (2001)
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Journal Article
Chemical Vapor Deposition of TixSi1-xO2 Films: Precursor Chemistry Impacts Films Composition
Smith, R.C., Hoilien, N., Dykstra, C., Campbell, S.A., Roberts, J.T., Gladfelter, W.L.
Published in Chemical vapor deposition (17.03.2003)
Published in Chemical vapor deposition (17.03.2003)
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Journal Article
Chemical Vapor Deposition of Ti x Si 1– x O 2 Films: Precursor Chemistry Impacts Films Composition
Smith, R.C., Hoilien, N., Dykstra, C., Campbell, S.A., Roberts, J.T., Gladfelter, W.L.
Published in Chemical vapor deposition (17.03.2003)
Published in Chemical vapor deposition (17.03.2003)
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Journal Article
Oxygen and ruthenium methylation of Ru sub 2 ((H sub 3 C) sub 2 PCH sub 2 P(CH sub 3 ) sub 2 ) sub 2 (CO) sub 5. Formation and interconversion of terminal and bridging acetyl ligands and molecular structure of (Ru sub 2 ((H sub 3 C) sub 2 PCH sub 2 P(CH sub 3 ) sub 2 ) sub 2 (. mu. -COCH sub 3 )(CO) sub 4 )(CF sub 3 SO sub 3 )
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Journal Article
MOSFET transistors fabricated with high permitivity TiO/sub 2/ dielectrics
Campbell, S.A., Gilmer, D.C., Xiao-Chuan Wang, Ming-Ta Hsieh, Hyeon-Seag Kim, Gladfelter, W.L., Jinhua Yan
Published in IEEE transactions on electron devices (01.01.1997)
Published in IEEE transactions on electron devices (01.01.1997)
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Journal Article
On the mechanism of homogeneous catalytic hydrogenation using anion-promoted metal clusters
Zuffa, Janet L, Gladfelter, Wayne L
Published in Journal of the American Chemical Society (01.07.1986)
Published in Journal of the American Chemical Society (01.07.1986)
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Journal Article
Formation and cleavage of N-H bonds on nitrido metal carbonyl clusters
BLOHM, M. L, FJARE, D. E, GLADFELTER, W. L
Published in Journal of the American Chemical Society (30.04.1986)
Published in Journal of the American Chemical Society (30.04.1986)
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Journal Article
Rapid olefin hydrogenation catalyzed by anion-promoted ruthenium clusters
Zuffa, Janet L, Blohm, Margaret L, Gladfelter, Wayne L
Published in Journal of the American Chemical Society (01.02.1986)
Published in Journal of the American Chemical Society (01.02.1986)
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Journal Article
Reaction of tetranuclear mixed-metal clusters with carbon monoxide
Fox, Joseph R, Gladfelter, Wayne L, Geoffroy, Gregory L
Published in Inorganic chemistry (01.09.1980)
Published in Inorganic chemistry (01.09.1980)
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Journal Article
The performance of high permitivity TiO/sub 2/ dielectric MOSFETs
Campbell, S.A., Gilmer, D.C., Wang, X., Hsiehl, M.T., Kim, H.S., Gladfelter, W.L., Yan, J.H.
Published in 1996 54th Annual Device Research Conference Digest (1996)
Published in 1996 54th Annual Device Research Conference Digest (1996)
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Conference Proceeding
High permittivity gate insulators TiO/sub 2/ and ZrO/sub 2
He, B., Hoilien, N., Smith, R., Ma, T., Taylor, C., St. Omer, I., Campbell, S.A., Gladfelter, W.L., Gribelyuk, M., Buchanan, D.
Published in Proceedings of the Thirteenth Biennial University/Government/Industry Microelectronics Symposium (Cat. No.99CH36301) (1999)
Published in Proceedings of the Thirteenth Biennial University/Government/Industry Microelectronics Symposium (Cat. No.99CH36301) (1999)
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