Evaluation of Pure Novolak Cresol‐Formaldehyde Resins for Deep U.V. Lithography
Gipstein, E., Ouano, A. C., Tompkins, T.
Published in Journal of the Electrochemical Society (01.01.1982)
Published in Journal of the Electrochemical Society (01.01.1982)
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Journal Article
Poly(Methyl Methacrylate‐Isobutylene) Copolymers as Highly Sensitive Electron Beam Resists
Gipstein, Edward, Moreau, Wayne, Need, Omar
Published in Journal of the Electrochemical Society (01.01.1976)
Published in Journal of the Electrochemical Society (01.01.1976)
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Journal Article