A PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR SI_1 XGEX MATERIAL IN THE PRESENCE OF A CMP COMPOSITION HAVING A PH VALUE OF 3.0 TO 5.5
GILLOT CHRISTOPHE, LI YUZHUO, NOLLER BASTIAN MARTEN, DRESCHER BETTINA
Year of Publication 11.06.2014
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Year of Publication 11.06.2014
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A PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR SI_1 X GE X MATERIAL IN THE PRESENCE OF A CMP COMPOSITION COMPRISING A SPECIFIC ORGANIC COMPOUND
GILLOT CHRISTOPHE, LI YUZHUO, NOLLER BASTIAN MARTEN, DRESCHER BETTINA
Year of Publication 15.05.2014
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Year of Publication 15.05.2014
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Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of elemental germanium and/or Si1-xGex material in the presence of a CMP composition comprising a specific organic compound
Drescher Bettina, Noller Bastian Marten, Li Yuzhuo, Gillot Christophe
Year of Publication 13.09.2016
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Year of Publication 13.09.2016
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A PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR Si1-xGex MATERIAL IN THE PRESENCE OF A CMP COMPOSITION COMPRISING A SPECIFIC ORGANIC COMPOUND
LI, YUZHUO, GILLOT, CHRISTOPHE, DRESCHER, BETTINA, NOLLER, BASTIAN MARTEN, GAO, NING
Year of Publication 21.09.2016
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Year of Publication 21.09.2016
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A PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR Si1-xGex MATERIAL IN THE PRESENCE OF A CMP COMPOSITION COMPRISING A SPECIFIC ORGANIC COMPOUND
LI, YUZHUO, GILLOT, CHRISTOPHE, DRESCHER, BETTINA, NOLLER, BASTIAN MARTEN, GAO, NING
Year of Publication 25.03.2015
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Year of Publication 25.03.2015
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A PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR Si1-XGeX MATERIAL IN THE PRESENCE OF A CMP COMPOSITION HAVING A pH VALUE OF 3.0 TO 5.5
GILLOT, CHRISTOPHE, DRESCHER, BETTINA, NOLLER, BASTIAN MARTEN, LI, YUZHOU
Year of Publication 18.03.2015
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Year of Publication 18.03.2015
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PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR SI1-XGEX MATERIAL IN THE PRESENCE OF A CMP COMPOSITION HAVING A PH VALUE OF 3.0 TO 5.5
GILLOT CHRISTOPHE, LI YUZHUO, NOLLER BASTIAN MARTEN, DRESCHER BETTINA
Year of Publication 17.07.2014
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Year of Publication 17.07.2014
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PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR SI1-XGEX MATERIAL IN THE PRESENCE OF A CMP COMPOSITION COMPRISING A SPECIFIC ORGANIC COMPOUND
GILLOT CHRISTOPHE, LI YUZHUO, NOLLER BASTIAN MARTEN, DRESCHER BETTINA
Year of Publication 19.06.2014
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Year of Publication 19.06.2014
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A PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR Si1-xGex MATERIAL IN THE PRESENCE OF A CMP COMPOSITION COMPRISING A SPECIFIC ORGANIC COMPOUND
LI, YUZHUO, GILLOT, CHRISTOPHE, DRESCHER, BETTINA, NOLLER, BASTIAN MARTEN, GAO, NING
Year of Publication 18.06.2014
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Year of Publication 18.06.2014
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A PROCESS FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES COMPRISING THE CHEMICAL MECHANICAL POLISHING OF ELEMENTAL GERMANIUM AND/OR Si1-XGeX MATERIAL IN THE PRESENCE OF A CMP COMPOSITION HAVING A pH VALUE OF 3.0 TO 5.5
GILLOT, CHRISTOPHE, DRESCHER, BETTINA, NOLLER, BASTIAN MARTEN, LI, YUZHOU
Year of Publication 18.06.2014
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Year of Publication 18.06.2014
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