Search Results - "Ghinovker Mark" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

ROTATIONAL MULTI-LAYER OVERLAY MARKS, APPARATUS, AND METHODS

ROTATIONAL MULTI-LAYER OVERLAY MARKS, APPARATUS, AND METHODS

by GHINOVKER, MARK
Year of Publication 27.06.2013

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Patent

ROTATIONAL MULTI-LAYER OVERLAY MARKS, APPARATUS, AND METHODS

ROTATIONAL MULTI-LAYER OVERLAY MARKS, APPARATUS, AND METHODS

by GHINOVKER MARK
Year of Publication 27.06.2013

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Patent

MULTI-LAYERED MOIRE TARGETS AND METHODS FOR USING THE SAME IN MEASURING MISREGISTRATION OF SEMICONDUCTOR DEVICES

MULTI-LAYERED MOIRE TARGETS AND METHODS FOR USING THE SAME IN MEASURING MISREGISTRATION OF SEMICONDUCTOR DEVICES

by GHINOVKER MARK, FELER YOEL
Year of Publication 01.02.2022

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Patent

Imaging overlay targets using Moiré elements and rotational symmetry arrangements

Imaging overlay targets using Moiré elements and rotational symmetry arrangements

by Gurevich, Evgeni, Shaphirov, Diana, Levinski, Vladimir, Feler, Yoel, Ghinovker, Mark
Year of Publication 22.02.2022

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Patent

MISREGISTRATION METROLOGY BY USING FRINGE MOIRÉ AND OPTICAL MOIRÉ EFFECTS

MISREGISTRATION METROLOGY BY USING FRINGE MOIRÉ AND OPTICAL MOIRÉ EFFECTS

by GHINOVKER, Mark, FELER, Yoel, GUREVICH, Evgeni, SVIZHER, Alexander, LEVINSKI, Vladimir
Year of Publication 27.01.2022

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Patent

DEVICE-LIKE OVERLAY METROLOGY TARGETS DISPLAYING MOIRÉ EFFECTS

DEVICE-LIKE OVERLAY METROLOGY TARGETS DISPLAYING MOIRÉ EFFECTS

by Yohanan, Raviv, Ghinovker, Mark, Yerushalmi, Liran, Volkovich, Roie
Year of Publication 20.01.2022

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Patent

Misregistration Target Having Device-Scaled Features Useful in Measuring Misregistration of Semiconductor Devices

Misregistration Target Having Device-Scaled Features Useful in Measuring Misregistration of Semiconductor Devices

by Yohanan, Raviv, Ghinovker, Mark, Yerushalmi, Liran, Volkovich, Roie
Year of Publication 13.01.2022

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Patent

DEVICE-LIKE OVERLAY METROLOGY TARGETS DISPLAYING MOIRÉ EFFECTS

DEVICE-LIKE OVERLAY METROLOGY TARGETS DISPLAYING MOIRÉ EFFECTS

by GHINOVKER, Mark, YOHANAN, Raviv, VOLKOVICH, Roie, YERUSHALMI, Liran
Year of Publication 13.01.2022

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Patent

Misregistration metrology by using fringe Moiré and optical Moiré effects

Misregistration metrology by using fringe Moiré and optical Moiré effects

by Gurevich, Evgeni, Levinski, Vladimir, Feler, Yoel, Ghinovker, Mark, Svizher, Alexander
Year of Publication 02.11.2021

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Patent

METROLOGY TARGET FOR SCANNING METROLOGY

METROLOGY TARGET FOR SCANNING METROLOGY

by HILL, Andrew. V, GHINOVKER, Mark, LAREDO, Gilad, FELER, Yoel, LEVINSKI, Vladimir, MANASSEN, Amnon
Year of Publication 19.07.2023

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Patent

MISREGISTRATION TARGET HAVING DEVICE-SCALED FEATURES USEFUL IN MEASURING MISREGISTRATION OF SEMICONDUCTOR DEVICES

MISREGISTRATION TARGET HAVING DEVICE-SCALED FEATURES USEFUL IN MEASURING MISREGISTRATION OF SEMICONDUCTOR DEVICES

by GHINOVKER, Mark, YOHANAN, Raviv, VOLKOVICH, Roie, YERUSHALMI, Liran
Year of Publication 21.10.2021

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Patent

COMPOSITE OVERLAY METROLOGY TARGET

COMPOSITE OVERLAY METROLOGY TARGET

by GHINOVKER, Mark, DIRAWI, Rawi, TARSHISH-SHAPIR, Inna, GOLOTSVAN, Anna
Year of Publication 05.08.2021

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Patent

COMPOSITE OVERLAY METROLOGY TARGET

COMPOSITE OVERLAY METROLOGY TARGET

by Tarshish-Shapir, Inna, Golotsvan, Anna, Ghinovker, Mark, Dirawi, Rawi
Year of Publication 05.08.2021

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Patent

APPARATUS AND METHODS FOR DETERMINING OVERLAY OF STRUCTURES HAVING ROTATIONAL OR MIRROR SYMMETRY

APPARATUS AND METHODS FOR DETERMINING OVERLAY OF STRUCTURES HAVING ROTATIONAL OR MIRROR SYMMETRY

by GHINOVKER MARK
Year of Publication 21.06.2012

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Patent

Optimized overlay metrology marks: theory and experiment

Optimized overlay metrology marks: theory and experiment

by Adel, M., Ghinovker, M., Golovanevsky, B., Izikson, P., Kassel, E., Yaffe, D., Bruckstein, A.M., Goldenberg, R., Rubner, Y., Rudzsky, M.
Published in IEEE transactions on semiconductor manufacturing (01.05.2004)

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Journal Article

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY MEASUREMENTS

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY MEASUREMENTS

by Gurevich, Evgeni, Levinski, Vladimir, Aharon, Sharon, Golotsvan, Anna, Gronheid, Roel, Feler, Yoel, Ghinovker, Mark
Year of Publication 30.03.2023

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Patent

Apparatus and methods for determining overlay of structures having rotational or mirror symmetry

Apparatus and methods for determining overlay of structures having rotational or mirror symmetry

by GHINOVKER MARK
Year of Publication 20.03.2012

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Patent

Apparatus and methods for determining overlay of structures having rotational or mirror symmetry

Apparatus and methods for determining overlay of structures having rotational or mirror symmetry

by Ghinovker, Mark
Year of Publication 20.03.2012

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Patent

Multi-layered moire targets and methods for using the same in measuring misregistration of semiconductor devices

Multi-layered moire targets and methods for using the same in measuring misregistration of semiconductor devices

by FELER, YOEL, GHINOVKER, MARK
Year of Publication 01.02.2021

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Patent

Reduction or elimination of pattern placement error in metrology measurements

Reduction or elimination of pattern placement error in metrology measurements

by Gurevich, Evgeni, Levinski, Vladimir, Aharon, Sharon, Golotsvan, Anna, Gronheid, Roel, Feler, Yoel, Ghinovker, Mark
Year of Publication 27.12.2022

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Patent

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