Effect of the amorphous-to-crystalline transition in Ba 0.5 Sr 0.5 TiO 3 thin films on optical and microwave dielectric properties
Venkata Saravanan, K, Sudheendran, K, Ghanashyam Krishna, M, James Raju, K C
Published in Journal of physics. D, Applied physics (21.02.2009)
Published in Journal of physics. D, Applied physics (21.02.2009)
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Study of discharge characteristics in pure argon and oxygen during dc sputtering of YBaCuO films
Muralidhar, GK, Mohan Rao, G, Ghanashyam Krishna, M, Narasimha Rao, K, Menon, AG, Balasubramanian, TV, Mohan, S
Published in Vacuum (01.10.1993)
Published in Vacuum (01.10.1993)
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Microwave dielectric behavior of nanocrystalline titanium dioxide thin films
Pamu, D., Sudheendran, K., Krishna, M.Ghanashyam, James Raju, K.C., Bhatnagar, Anil K.
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Published in Vacuum (01.01.2007)
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Effect of process parameters and post deposition annealing on the optical, structural and microwave dielectric properties of RF magnetron sputtered (Ba 0.5,Sr 0.5)TiO 3 thin films
Venkata Saravanan, K., Sudheendran, K., Ghanashyam Krishna, M., James Raju, K.C., Bhatnagar, Anil K.
Published in Vacuum (2006)
Published in Vacuum (2006)
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The role of graphitic filaments in resistive switching behaviour of amorphous silicon carbide thin films
Akshara, P. Chaitanya, Basu, Nilanjan, Lahiri, Jayeeta, Rajaram, G, Krishna, M. Ghanashyam
Year of Publication 12.08.2019
Year of Publication 12.08.2019
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Structure, oxygen stoichiometry and electrical conductivity of LnPrO 3+y (Ln=Y and Lanthanide) oxides
Rajendran, M, Ghanashyam Krishna, M, Mallick, K.K, Bhattacharya, A.K
Published in Materials science & engineering. B, Solid-state materials for advanced technology (1999)
Published in Materials science & engineering. B, Solid-state materials for advanced technology (1999)
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