Nickel silicides and germanides: Phases formation, kinetics and thermal expansion
Perrin, C., Mangelinck, D., Nemouchi, F., Labar, J., Lavoie, C., Bergman, C., Gas, P.
Published in Materials science & engineering. B, Solid-state materials for advanced technology (05.12.2008)
Published in Materials science & engineering. B, Solid-state materials for advanced technology (05.12.2008)
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Journal Article
A comparative study of nickel silicides and nickel germanides: Phase formation and kinetics
Nemouchi, F., Mangelinck, D., Lábár, J.L., Putero, M., Bergman, C., Gas, P.
Published in Microelectronic engineering (01.11.2006)
Published in Microelectronic engineering (01.11.2006)
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Journal Article
Conference Proceeding
Effect of Co, Pt, and Au additions on the stability and epitaxy of NiSi2 films on (111)Si
Mangelinck, D., Gas, P., Gay, J. M., Pichaud, B., Thomas, O.
Published in Journal of applied physics (01.09.1998)
Published in Journal of applied physics (01.09.1998)
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Journal Article
Interfacial interaction of solid nickel with liquid bismuth and Bi–base alloys
Dybkov, V.I., Barmak, K., Lengauer, W., Gas, P.
Published in Journal of alloys and compounds (08.03.2005)
Published in Journal of alloys and compounds (08.03.2005)
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Journal Article
Redistribution of arsenic during the reaction of nickel thin films with silicon at relatively high temperature: Role of agglomeration
Hoummada, K., Mangelinck, D., Perrin, C., Gas, P., Carron, V., Holliger, P., Ziegler, E.
Published in Microelectronic engineering (01.11.2006)
Published in Microelectronic engineering (01.11.2006)
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Journal Article
Conference Proceeding
Sb segregation in Si and SiGe: effect on the growth of self-organised Ge dots
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Journal Article
Conference Proceeding
Lattice diffusion and surface segregation of B during growth of SiGe heterostructures by molecular beam epitaxy: Effect of Ge concentration and biaxial stress
Portavoce, A., Gas, P., Berbezier, I., Ronda, A., Christensen, J. S., Svensson, B.
Published in Journal of applied physics (15.09.2004)
Published in Journal of applied physics (15.09.2004)
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Journal Article
Initial formation and growth of an amorphous phase in Al–Pt thin films and multilayers: Role of diffusion
Gas, P., Labar, J., Clugnet, G., Kovacs, A., Bergman, C., Barna, P.
Published in Journal of applied physics (15.10.2001)
Published in Journal of applied physics (15.10.2001)
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Journal Article
Formation of Ni silicide from Ni(Au) films on (111)Si
Mangelinck, D., Gas, P., Grob, A., Pichaud, B., Thomas, O.
Published in Journal of applied physics (15.04.1996)
Published in Journal of applied physics (15.04.1996)
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Journal Article