Chemical vapour deposition of praseodymium oxide films on silicon: influence of temperature and oxygen pressure
Abrutis, A., Lukosius, M., Saltyte, Z., Galvelis, R., Baumann, P.K., Schumacher, M., Lindner, J.
Published in Thin solid films (02.06.2008)
Published in Thin solid films (02.06.2008)
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