Technology and optimization of hafnium oxynitride (HfOxNy) thin-films formed by pulsed-DC reactive magnetron sputtering for MIS devices
Puźniak, Mirosław, Gajewski, Wojtek, Żelechowski, Marcin, Jamroz, Jan, Gertych, Arkadiusz, Zdrojek, Mariusz, Mroczyński, Robert
Published in Microelectronic engineering (01.05.2020)
Published in Microelectronic engineering (01.05.2020)
Get full text
Journal Article