Search Results - "Gai Chenguang" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

Challenges and solutions for 14nm FinFET etching

Challenges and solutions for 14nm FinFET etching

by Huang Jun, Li Quanbo, Chong Ermin, Yi Chunyan, Li Runling, Gai Chenguang, Ma Zhibiao, Yu Zhang, Pang, Albert
Published in 2015 China Semiconductor Technology International Conference (01.03.2015)

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Conference Proceeding Journal Article

28nm Metal Hard Mask etch process development

28nm Metal Hard Mask etch process development

by Zhang, Liyan, Gai, Chenguang, Ren, Hongrui, Huang, Jun, Zhang, Xu, Pen, Shugen, Zhang, Yu, Ge, Qiang
Published in 2015 China Semiconductor Technology International Conference (01.03.2015)

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Conference Proceeding Journal Article

Contact hole forming method

Contact hole forming method

by HUANG HAI, GAI CHENGUANG, HUANG JUN
Year of Publication 24.06.2015

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Patent

First layer metal trench etching method

First layer metal trench etching method

by REN HONGRUI, GAI CHENGUANG, ZHANG LIYAN, HUANG JUN
Year of Publication 06.01.2016

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Patent

Defect solution scheme for 40/45 nano process metal hard photomask structure

Defect solution scheme for 40/45 nano process metal hard photomask structure

by GAI CHENGUANG, ZHANG YU, HUANG JUN
Year of Publication 24.06.2015

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Patent

Detection method of black silicon on top electrode of etching machine platform

Detection method of black silicon on top electrode of etching machine platform

by GAI CHENGUANG, HUANG JUN, ZHANG YU
Year of Publication 17.06.2015

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Patent

Defect solving means for metal hard photomask structure in 40/45 nanometer technology

Defect solving means for metal hard photomask structure in 40/45 nanometer technology

by GAI CHENGUANG, ZHANG YU, HUANG JUN
Year of Publication 20.05.2015

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Patent

Manufacture method of contact hole

Manufacture method of contact hole

by GAI CHENGUANG, ZHANG YU, HUANG JUN
Year of Publication 18.03.2015

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Patent

Method for etching bottom anti-reflective coating in dual damascene structure

Method for etching bottom anti-reflective coating in dual damascene structure

by GAI CHENGUANG, HUANG JUN, ZHANG YU
Year of Publication 18.02.2015

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Patent

Method of forming contact hole

Method of forming contact hole

by GAI CHENGUANG, ZHANG YU, HUANG JUN
Year of Publication 27.05.2014

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Patent

METHOD OF FORMING CONTACT HOLE

METHOD OF FORMING CONTACT HOLE

by GAI CHENGUANG, ZHANG YU, HUANG JUN
Year of Publication 15.05.2014

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Patent

Method of improving etching morphology of dual damascene structure dielectric film

Method of improving etching morphology of dual damascene structure dielectric film

by HUANG HAI, GAI CHENGUANG, HUANG JUN
Year of Publication 24.04.2013

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Patent

Detection method of black silicon on top electrode of etching machine platform

Detection method of black silicon on top electrode of etching machine platform

by GAI CHENGUANG, HUANG JUN, ZHANG YU
Year of Publication 13.03.2013

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Patent

Manufacture method of contact hole

Manufacture method of contact hole

by GAI CHENGUANG, ZHANG YU, HUANG JUN
Year of Publication 13.03.2013

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Patent

Method for improving etched via bottom critical dimension of 40 nm dual damascene structure

Method for improving etched via bottom critical dimension of 40 nm dual damascene structure

by GAI CHENGUANG, HUANG JUN, ZHANG YU
Year of Publication 16.01.2013

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Patent

Method for improving KINK defect in dual damascene process

Method for improving KINK defect in dual damascene process

by GAI CHENGUANG, HUANG JUN, ZHANG YU
Year of Publication 16.01.2013

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Patent

Method for improving defects in dual damascene process

Method for improving defects in dual damascene process

by GAI CHENGUANG, HUANG JUN, ZHANG YU
Year of Publication 16.01.2013

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Patent

Novel process for performing dielectric membrane etching by using intramembrane blocking layer structure

Novel process for performing dielectric membrane etching by using intramembrane blocking layer structure

by HUANG HAI, GAI CHENGUANG, ZHANG YU
Year of Publication 09.01.2013

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Patent

Method for increasing 1X DD (dual damascene) etching uniformity and reducing photoresist consumption

Method for increasing 1X DD (dual damascene) etching uniformity and reducing photoresist consumption

by GAI CHENGUANG, HUANG JUN, ZHANG YU
Year of Publication 09.01.2013

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Patent

Defect solution scheme for 40/45 nano process metal hard photomask structure

Defect solution scheme for 40/45 nano process metal hard photomask structure

by GAI CHENGUANG, ZHANG YU, HUANG JUN
Year of Publication 09.01.2013

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Patent