Mask etch plasma reactor with variable process gas distribution
PANAYIL SHEEBA J, IBRAHIM IBRAHIM M, KUMAR AJAY, GRIMBERGEN MICHAEL N, LEWINGTON RICHARD, NGUYEN KHIEM K, CHANDRACHOOD MADHAVI R
Year of Publication 26.09.2012
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Year of Publication 26.09.2012
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Mask etch plasma reactor with variable process gas distribution
KUMAR, AJAY, LEWINGTON, RICHARD, IBRAHIM, IBRAHIM M, GRIMBERGEN, MICHAEL N, NGUYEN, KHIEM K, PANAYIL, SHEEBA J, CHANDRACHOOD, MADHAVI R
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Year of Publication 01.06.2012
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Plasma reactor with a dynamically adjustable plasma source power applicator
BIVENS DARIN, PANAYIL SHEEBA J, IBRAHIM IBRAHIM M, KUMAR AJAY, GRIMBERGEN MICHAEL N, LEWINGTON RICHARD, KOCH RENEE, CHANDRACHOOD MADHAVI R
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Year of Publication 01.06.2011
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Mask etch plasma reactor with cathode lift pin assembly
RICHARD, LEWINGTON, KUMAR, AJAY, MICHAEL N., GRIMBERGEN, KHIEM K., NGUYEN, DARIN, BIVENS, MADHAVI R., CHANDRACHOOD
Year of Publication 21.10.2008
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Year of Publication 21.10.2008
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Phase shifting photomask and a method of fabricating thereof
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Year of Publication 16.05.2008
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KUMAR, AJAY, LEWINGTON, RICHARD, IBRAHIM, IBRAHIM M, GRIMBERGEN, MICHAEL N, NGUYEN, KHIEM K, PANAYIL, SHEEBA J, CHANDRACHOOD, MADHAVI R
Year of Publication 01.02.2009
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Year of Publication 01.02.2009
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Mask etch plasma reactor with variable process gas distribution
KUMAR, AJAY, LEWINGTON, RICHARD, IBRAHIM, IBRAHIM M, GRIMBERGEN, MICHAEL N, NGUYEN, KHIEM K, PANAYIL, SHEEBA J, CHANDRACHOOD, MADHAVI R
Year of Publication 01.05.2008
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Year of Publication 01.05.2008
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