Experimental determination of the attenuation length of electrons in organic molecular solids: The example of PTCDA
Graber, Tina, Forster, Frank, Schöll, Achim, Reinert, Friedrich
Published in Surface science (01.05.2011)
Published in Surface science (01.05.2011)
Get full text
Journal Article
OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD FOR TREATING SUCH AN OPTICAL ELEMENT
BEKMAN HERMANUS HENDRICUS PETRUS THEODORUS, EHM DIRK HEINRICH, KUZNETSOV ALEXEY, HUIJBREGTSE JEROEN, STORM ARNOLDUS JAN, AMENT IRENE, GRABER TINA, SMEETS DRIES, TE SLIGTE EDWIN
Year of Publication 23.11.2015
Get full text
Year of Publication 23.11.2015
Patent
INNENGEHÄUSEANORDNUNG FÜR EINE OPTISCHE ANORDNUNG
Ehm, Dirk, Focht, Gerhard, Modeste, Benjahman Julius, Graber, Tina, Kugler, Jens, Bauer, Johannes, Zweering, Ralf
Year of Publication 03.08.2023
Get full text
Year of Publication 03.08.2023
Patent
Optical element and optical system for EUV lithography, and method for treating such an optical element
Huijbregtse, Jeroen, Te Sligte, Edwin, Storm, Arnoldus Jan, Graber, Tina, Bekman, Hermanus Hendricus Petrus Theodorus, Ehm, Dirk Heinrich, Ament, Irene, Smeets, Dries, Kuznetsov, Alexey
Year of Publication 23.06.2020
Get full text
Year of Publication 23.06.2020
Patent
OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD FOR TREATING SUCH AN OPTICAL ELEMENT
BEKMAN HERMANUS HENDRICUS PETRUS THEODORUS, EHM DIRK HEINRICH, KUZNETSOV ALEXEY, HUIJBREGTSE JEROEN, STORM ARNOLDUS JAN, AMENT IRENE, GRABER TINA, SMEETS DRIES, TE SLIGTE EDWIN
Year of Publication 30.06.2016
Get full text
Year of Publication 30.06.2016
Patent
Optical element and optical system for EUV lithography, and method for treating such an optical element
BEKMAN HERMANUS HENDRICUS PETRUS THEODORUS, EHM DIRK HEINRICH, KUZNETSOV ALEXEY, HUIJBREGTSE JEROEN, STORM ARNOLDUS JAN, AMENT IRENE, GRABER TINA, SMEETS DRIES, TE SLIGTE EDWIN
Year of Publication 18.11.2015
Get full text
Year of Publication 18.11.2015
Patent
METHOD FOR OPTIMIZING A PROTECTIVE LAYER SYSTEM FOR AN OPTICAL ELEMENT, OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY
STORM, ARNOLDUS, JAN, GRABER, TINA, TE SLIGTE, EDWIN, BEKMANN, HERMANUS, HENDRICUS, PETRUS, THEODORUS, EHM, DIRK, HEINRICH, HUIJBREGTSE, JEROEN
Year of Publication 29.08.2013
Get full text
Year of Publication 29.08.2013
Patent
OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD FOR TREATING SUCH AN OPTICAL ELEMENT
KUZNETSOV, ALEXEY, BEKMAN, HERMANUS HENDRICUS PETRUS THEODORUS, GRABER, TINA, TE SLIGTE, EDWIN, STORM, ARNOLDUS JAN, EHM, DIRK HEINRICH, HUIJBREGTSE, JEROEN, AMENT, IRENE, SMEETSIES
Year of Publication 18.09.2014
Get full text
Year of Publication 18.09.2014
Patent
Verfahren zum Optimieren eines Schutzlagensystems für ein optisches Element, optisches Element und optisches System für die EUV-Lithographie
THEODORUS, HERMANUS HENDRICUS PETRUS, GRABER, TINA, TE SLIGTE, EDWIN, STORM, ARNOLDUS JAN, EHM, DIRK HEINRICH, HUIJBREGTSE, JEROEN
Year of Publication 29.08.2013
Get full text
Year of Publication 29.08.2013
Patent
Optisches Element und optisches System für die EUV-Lithographie sowie Verfahren zur Behandlung eines solchen optischen Elements
BEKMAN, HERMANUS, EHM, DIRK, HUIJBREGSTE, JEROEN, KUZNETSOV, ALEXEY, GRABER, TINA, TE SLIGTE, EDWIN, STORM, ARNOLDUS JAN, AMENT, IRENE, SMEETSIES
Year of Publication 02.10.2014
Get full text
Year of Publication 02.10.2014
Patent