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Published in Japanese Journal of Applied Physics (01.04.2014)
Published in Japanese Journal of Applied Physics (01.04.2014)
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Progress report on high aspect ratio patterning for memory devices
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Published in Japanese Journal of Applied Physics (01.07.2023)
Published in Japanese Journal of Applied Physics (01.07.2023)
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INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION
GOWRI KAMARTHY, VAHID VAHEDI, ALEX PATERSON, MONICA TITUS, SINGH HARMEET, THORSTEN LILL
Year of Publication 18.12.2014
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Year of Publication 18.12.2014
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APPLICATION OF INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION
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Year of Publication 06.11.2014
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Year of Publication 06.11.2014
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Enabling High Aspect Ratio 3D NAND Scaling through Deposition and Etch Co-Optimization (DECO)
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Published in Meeting abstracts (Electrochemical Society) (09.10.2022)
Published in Meeting abstracts (Electrochemical Society) (09.10.2022)
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HIGH ASPECT RATIO CARBON ETCH WITH SIMULATED BOSCH PROCESS
KAMARTHY, Gowri Channa, SUBRAMANIAN, Priyadarsini, SU, Xiaofeng, LI, Jing, TAN, Zhongkui
Year of Publication 25.01.2024
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Year of Publication 25.01.2024
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ION BEAM ETCHING WITH GAS TREATMENT AND PULSING
LI, Weiyi, KAMARTHY, Gowri Channa, YUN, Seokmin, HUANG, Shuogang, WAN, Zhimin
Year of Publication 31.03.2022
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Year of Publication 31.03.2022
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IN SITU DECLOGGING IN PLASMA ETCHING
KAWAGUCHI, Mark Naoshi, ZHU, Ji, KAMARTHY, Gowri Channa, LIU, Wenchi, SUBRAMANIAN, Priyadarsini, MA, Qiang, SU, Xiaofeng, TAN, Zhongkui
Year of Publication 14.12.2023
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Year of Publication 14.12.2023
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IN SITU DECLOGGING IN PLASMA ETCHING
KAWAGUCHI, Mark Naoshi, ZHU, Ji, KAMARTHY, Gowri Channa, LIU, Wenchi, SUBRAMANIAN, Priyadarsini, MA, Qiang, SU, Xiaofeng, TAN, Zhongkui
Year of Publication 27.04.2023
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Year of Publication 27.04.2023
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Film stack simplification for high aspect ratio patterning and vertical scaling
Yang, Jialing, Chi, Hao, van Schravendijk, Bart J, Kawaguchi, Mark Naoshi, Musselwhite, Nathan, Uglow, Jay E, Altieri, Nicholas Dominic, Shankar, Nagraj, Shen, Meihua, Banerji, Ananda K, Kamarthy, Gowri Channa, Wu, Hui-Jung, Lill, Thorsten Bernd, Hoang, John, Routzahn, Aaron Lynn, Gunawan, Gereng, McLaughlin, Kevin M
Year of Publication 03.09.2024
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Year of Publication 03.09.2024
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ION BEAM ETCHING WITH GAS TREATMENT AND PULSING
LI, Weiyi, KAMARTHY, Gowri Channa, YUN, Seokmin, HUANG, Shuogang, WAN, Zhimin
Year of Publication 06.08.2020
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Year of Publication 06.08.2020
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Internal plasma grid for semiconductor fabrication
Lill, Thorsten, Titus, Monica, Singh, Harmeet, Vahedi, Vahid, Kamarthy, Gowri, Paterson, Alex
Year of Publication 05.03.2019
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Year of Publication 05.03.2019
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High aspect ratio carbon etch with simulated BOSCH process
TAN, ZHONG-KUI, KAMARTHY, GOWRI CHANNA, SUBRAMANIAN, PRIYADARSINI, SU, XIAO-FENG, LI, JING
Year of Publication 16.05.2024
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Year of Publication 16.05.2024
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