Atomic Layer Etching: Rethinking the Art of Etch
Kanarik, Keren J, Tan, Samantha, Gottscho, Richard A
Published in The journal of physical chemistry letters (16.08.2018)
Published in The journal of physical chemistry letters (16.08.2018)
Get full text
Journal Article
The grand challenges of plasma etching: a manufacturing perspective
Lee, Chris G N, Kanarik, Keren J, Gottscho, Richard A
Published in Journal of physics. D, Applied physics (09.07.2014)
Published in Journal of physics. D, Applied physics (09.07.2014)
Get full text
Journal Article
Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: a physics and chemistry perspective
Ishikawa, Kenji, Ishijima, Tatsuo, Shirafuji, Tatsuru, Armini, Silvia, Despiau-Pujo, Emilie, Gottscho, Richard A., Kanarik, Keren J., Leusink, Gert J., Marchack, Nathan, Murayama, Takahide, Morikawa, Yasuhiro, Oehrlein, Gottlieb S., Park, Sangwuk, Hayashi, Hisataka, Kinoshita, Keizo
Published in Japanese Journal of Applied Physics (01.06.2019)
Published in Japanese Journal of Applied Physics (01.06.2019)
Get full text
Journal Article
Overview of atomic layer etching in the semiconductor industry
Kanarik, Keren J., Lill, Thorsten, Hudson, Eric A., Sriraman, Saravanapriyan, Tan, Samantha, Marks, Jeffrey, Vahedi, Vahid, Gottscho, Richard A.
Published in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (01.03.2015)
Published in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (01.03.2015)
Get full text
Book Review
Human–machine collaboration for improving semiconductor process development
Kanarik, Keren J., Osowiecki, Wojciech T., Lu, Yu (Joe), Talukder, Dipongkar, Roschewsky, Niklas, Park, Sae Na, Kamon, Mattan, Fried, David M., Gottscho, Richard A.
Published in Nature (London) (27.04.2023)
Published in Nature (London) (27.04.2023)
Get full text
Journal Article
Predicting synergy in atomic layer etching
Kanarik, Keren J., Tan, Samantha, Yang, Wenbing, Kim, Taeseung, Lill, Thorsten, Kabansky, Alexander, Hudson, Eric A., Ohba, Tomihito, Nojiri, Kazuo, Yu, Jengyi, Wise, Rich, Berry, Ivan L., Pan, Yang, Marks, Jeffrey, Gottscho, Richard A.
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01.09.2017)
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01.09.2017)
Get full text
Journal Article
Highly Selective Directional Atomic Layer Etching of Silicon
Tan, Samantha, Yang, Wenbing, Kanarik, Keren J., Lill, Thorsten, Vahedi, Vahid, Marks, Jeff, Gottscho, Richard A.
Published in ECS journal of solid state science and technology (01.01.2015)
Published in ECS journal of solid state science and technology (01.01.2015)
Get full text
Journal Article
(Invited) Divide Et Impera: Towards New Frontiers with Atomic Layer Etching
Lill, Thorsten, Kanarik, Keren J., Tan, Samantha S.H., Shen, Meihua, Pan, Yang, Marks, Jeffrey, Vahedi, Vahid, Gottscho, Richard A.
Published in ECS transactions (10.09.2015)
Published in ECS transactions (10.09.2015)
Get full text
Journal Article
Aspect ratio independent etching : fact or fantasy ?
Get full text
Conference Proceeding
Journal Article
PREDICTING ETCH CHARACTERISTICS IN THERMAL ETCHING AND ATOMIC LAYER ETCHING
BERRY IVAN L, GOTTSCHO RICHARD A, LILL THORSTEN, FISCHER ANDREAS, DRAEGER NERISSA SUE
Year of Publication 07.12.2023
Get full text
Year of Publication 07.12.2023
Patent
Photoresist development with halide chemistries
GOTTSCHO RICHARD A, WEIDMAN TIMOTHY WILLIAM, FAN YIWEN, TAN SAMANTHA SIAMHWA, LI DA, VOLOSSKIY BORIS, PAN YANG, YANG WENBING, YU JENGYI, PETER DANIEL, MARKS JEFFREY
Year of Publication 30.08.2024
Get full text
Year of Publication 30.08.2024
Patent
Photoresist development with halide chemistries
GOTTSCHO RICHARD A, WEIDMAN TIMOTHY WILLIAM, FAN YIWEN, TAN SAMANTHA SIAMHWA, LI DA, VOLOSSKIY BORIS, PAN YANG, YANG WENBING, YU JENGYI, PETER DANIEL, MARKS JEFFREY
Year of Publication 30.08.2024
Get full text
Year of Publication 30.08.2024
Patent
Real-time monitoring of silicon nitride composition during plasma enhanced chemical vapor deposition
Get full text
Conference Proceeding
Journal Article
반도체 장비에 대한 결함 분류 및 소스 분석
GOTTSCHO RICHARD A, SAWLANI KAPIL, HANSEN KEITH, WELLS KEITH, DANEK MICHAL
Year of Publication 20.08.2021
Get full text
Year of Publication 20.08.2021
Patent
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTERNING
GOTTSCHO RICHARD A, WISE RICHARD, WEIDMAN TIMOTHY WILLIAM, PAN YANG, YU JENGYI, LIN QINGHUANG, TAN SAMANTHA S.H, HUBACEK JEROME, LAVOIE ADRIEN, ALVI MOHAMMED HAROON, KANAKASABAPATHY SIVANANDA KRISHNAN
Year of Publication 21.11.2023
Get full text
Year of Publication 21.11.2023
Patent
열적 에칭 및 원자 층 에칭에서 에칭 특성들 예측
GOTTSCHO RICHARD A, LILL THORSTEN, FISCHER ANDREAS, BERRY III IVAN L, DRAEGER NERISSA SUE
Year of Publication 21.12.2020
Get full text
Year of Publication 21.12.2020
Patent
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTERNING
GOTTSCHO RICHARD A, WISE RICHARD, WEIDMAN TIMOTHY WILLIAM, PAN YANG, YU JENGYI, LIN QINGHUANG, TAN SAMANTHA S.H, HUBACEK JEROME, LAVOIE ADRIEN, ALVI MOHAMMED HAROON, KANAKASABAPATHY SIVANANDA KRISHNAN
Year of Publication 20.04.2023
Get full text
Year of Publication 20.04.2023
Patent
방사선 포토레지스트 패터닝을 패터닝하기 위한 통합된 건식 프로세스
GOTTSCHO RICHARD A, WISE RICHARD, WEIDMAN TIMOTHY WILLIAM, PAN YANG, YU JENGYI, LIN QINGHUANG, TAN SAMANTHA S.H, HUBACEK JEROME, LAVOIE ADRIEN, ALVI MOHAMMED HAROON, KANAKASABAPATHY SIVANANDA KRISHNAN
Year of Publication 02.09.2022
Get full text
Year of Publication 02.09.2022
Patent