Advanced CMOS devices: Challenges and implant solutions
Colombeau, Benjamin, Guo, Baonian, Gossmann, Hans-Joachim, Khaja, Fareen, Pradhan, Nilay, Waite, Andrew, Rao, K. V., Thomidis, Christos, Shim, Kyu-Ha, Henry, Todd, Variam, Naushad
Published in Physica status solidi. A, Applications and materials science (01.01.2014)
Published in Physica status solidi. A, Applications and materials science (01.01.2014)
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Journal Article
Fabricating high efficiency solar cells with high sheet resistance emitters by ion implantation and contact resistance modeling
Bhosle, Vikram, Tsefrekas, Basil, Gossmann, Hans-Joachim L., Dube, Christopher E.
Published in 2013 IEEE 39th Photovoltaic Specialists Conference (PVSC) (01.06.2013)
Published in 2013 IEEE 39th Photovoltaic Specialists Conference (PVSC) (01.06.2013)
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Conference Proceeding
Next Generation Angle Control for Medium Current and High Energy Implanters
Olson, Joseph C, Gupta, Atul, Gossmann, Hans-Joachim L, Rodier, Dennis
Published in AIP conference proceedings (01.01.2008)
Published in AIP conference proceedings (01.01.2008)
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Journal Article
3 차원 디바이스를 제조하기 위한 방법
YOSHIDA NAOMI, GOSSMANN HANS JOACHIM L, SUN SHIYU, COLOMBEAU BENJAMIN
Year of Publication 26.12.2017
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Year of Publication 26.12.2017
Patent
Fin Doping by Hot Implant for 14nm FinFET Technology and Beyond
Wood, Bingxi Sun, Khaja, Fareen Adeni, Colombeau, Benjamin P, Sun, Shiyu, Waite, Andrew, Jin, Miao, Chen, Hao, Chan, Osbert, Thanigaivelan, Thirumal, Pradhan, Nilay, Gossmann, Hans-Joachim L, Sharma, Shashank, Chavva, Venkataramana R, Cai, Man-Ping, Okazaki, Motoya, Munnangi, Samuel Swaroop, Ni, Chi-Nung, Suen, Wesley, Chang, Chorng-Ping, Mayur, Abhilash, Variam, Naushad, Brand, Adam D
Published in ECS transactions (31.08.2013)
Published in ECS transactions (31.08.2013)
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Journal Article
Benefits of Zero Degree Single Wafer High Energy Implants for Advanced Semiconductor Device Fabrication
Lee, Woojin, Thanigaivelan, Thirumal, Gossmann, Hans-Joachim, Low, Russell, Colombeau, Benjamin, Lacey, Kerry, Merrill, Mark, Renau, Anthony
Published in Ion Implantation Technology 2008 (01.01.2008)
Published in Ion Implantation Technology 2008 (01.01.2008)
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Journal Article
FinFET and Nanowire-FET Device Design and Integration: FEOL Challenges and Solutions
Gossmann, Hans-Joachim L., Colombeau, Benjamin, Breil, Nicolas
Published in 2018 14th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT) (01.10.2018)
Published in 2018 14th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT) (01.10.2018)
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Conference Proceeding
Device and process design of leading edge transistors for performance and yield
Gossmann, Hans-Joachim L., Sherman, Steven S., Evans, Morgan, Anglin, Kevin
Published in 2016 13th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT) (01.10.2016)
Published in 2016 13th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT) (01.10.2016)
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Conference Proceeding
Transient enhanced diffusion of B in Si implanted with decaborane cluster ions
SOSNOWSKI, Marek, ALBANO, Maria A, CHENG LI, GOSSMANN, Hans Joachim L, JACOBSON, Dale C
Published in Journal of the Electrochemical Society (01.08.2002)
Published in Journal of the Electrochemical Society (01.08.2002)
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Journal Article
Process characterization for hydrogen and helium implantation
Baonian Guo, Gossmann, Hans-Joachim L., Waite, Andrew, Chavva, Venkataramana, Toh, Terry, Shengwu Chang, Gori, Brian
Published in 2014 20th International Conference on Ion Implantation Technology (IIT) (01.06.2014)
Published in 2014 20th International Conference on Ion Implantation Technology (IIT) (01.06.2014)
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Conference Proceeding
Enhancing tensile stress and source/drain activation with Si:C with innovations in ion implant and millisecond laser spike annealing
Maynard, Helen, Hatem, Christopher, Gossmann, Hans-Joachim, Erokhin, Yuri, Variam, Naushad, Shaoyin Chen, Yun Wang
Published in 2008 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors (01.09.2008)
Published in 2008 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors (01.09.2008)
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Conference Proceeding