Method and apparatus for controlling gas flow to a processing chamber
GEOFFRION BRUNO, GOLD EZRA ROBERT, CRUSE JAMES PATRICK, LEE JARED AHMAD, FOVELL RICHARD CHARLES, BUCHBERGER DOUGLAS ARTHUR
Year of Publication 03.09.2008
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Year of Publication 03.09.2008
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Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation
DOAN, KENNY L, BRILLHART, PAUL LUKAS, BERA, KALLOL, PU, BRYAN Y, GOLD, EZRA ROBERT, GEOFFRION, BRUNO, ZHAO, XIAOYE, HOFFMAN, DANIEL
Year of Publication 01.01.2008
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Year of Publication 01.01.2008
Patent