Search Results - "GOHIRA, TAKU" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

by GOHIRA TAKU, SUZUKI SHOI
Year of Publication 18.07.2024

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Patent

Repeated Acceleration of Thermal Ions by an Oblique Shock Wave and Associated Whistler Instabilities

Repeated Acceleration of Thermal Ions by an Oblique Shock Wave and Associated Whistler Instabilities

by TOIDA, Mieko, GOHIRA, Taku
Published in Plasma and Fusion Research (2010)

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Journal Article

METHOD FOR MEASURING THICKNESS OF FILM, AND PROCESSING APPARATUS

METHOD FOR MEASURING THICKNESS OF FILM, AND PROCESSING APPARATUS

by GOHIRA TAKU, NAGAI KENJI
Year of Publication 13.09.2023

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Patent

ETCHING METHOD AND ETCHING DEVICE

ETCHING METHOD AND ETCHING DEVICE

by GOHIRA TAKU, FUKUNAGA YUSUKE
Year of Publication 18.04.2023

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Patent

ETCHING METHOD AND ETCHING DEVICE

ETCHING METHOD AND ETCHING DEVICE

by FUKUNAGA Yusuke, GOHIRA Taku
Year of Publication 13.04.2023

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Patent

PLASMA PROCESSING METHOD INCLUDING CLEANING OF INSIDE OF CHAMBER MAIN BODY OF PLASMA PROCESSING APAPRATUS

PLASMA PROCESSING METHOD INCLUDING CLEANING OF INSIDE OF CHAMBER MAIN BODY OF PLASMA PROCESSING APAPRATUS

by GOHIRA TAKU, KUDO JIN
Year of Publication 06.03.2023

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Patent

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

by GOHIRA TAKU, HIRAYAMA TSUKASA
Year of Publication 07.10.2022

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Patent

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

by GOHIRA TAKU, HIRAYAMA TSUKASA
Year of Publication 05.10.2022

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Patent

METHOD FOR ETCHING MULTILAYER FILM

METHOD FOR ETCHING MULTILAYER FILM

by GOHIRA TAKU
Year of Publication 21.02.2019

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Patent

METHOD OF ETCHING MULTILAYERED FILM

METHOD OF ETCHING MULTILAYERED FILM

by GOHIRA TAKU
Year of Publication 11.02.2019

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Patent

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

by GOHIRA TAKU, NAKATANI MASAKO
Year of Publication 04.03.2022

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Patent

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

by NAKAYA MICHIKO, GOHIRA TAKU
Year of Publication 28.02.2022

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Patent

SUBSTRATE PROCESSING METHOD, AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD, AND SUBSTRATE PROCESSING APPARATUS

by GOHIRA Taku, NAKAYA Michiko, ISHII Akihiro
Year of Publication 28.03.2024

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Patent

ETCHING METHOD, AND PLASMA PROCESSING APPARATUS

ETCHING METHOD, AND PLASMA PROCESSING APPARATUS

by TADOKORO MASAHIRO, GOHIRA TAKU
Year of Publication 22.10.2020

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Patent

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

by TADOKORO MASAHIRO, GOHIRA TAKU
Year of Publication 16.10.2020

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Patent

Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O 2 /C 4 F 8 plasma etching process

Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O 2 /C 4 F 8 plasma etching process

by Sahu, Bibhuti Bhusan, Nakane, Kazuya, Ishikawa, Kenji, Sekine, Makoto, Tsutsumi, Takayoshi, Gohira, Taku, Ohya, Yoshinobu, Ohno, Noriyasu, Hori, Masaru
Published in Physical chemistry chemical physics : PCCP (08.06.2022)

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Journal Article

Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O/CF plasma etching process

Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O/CF plasma etching process

by Sahu, Bibhuti Bhusan, Nakane, Kazuya, Ishikawa, Kenji, Sekine, Makoto, Tsutsumi, Takayoshi, Gohira, Taku, Ohya, Yoshinobu, Ohno, Noriyasu, Hori, Masaru
Published in Physical chemistry chemical physics : PCCP (08.06.2022)

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Journal Article

Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process

Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process

by Sahu, Bibhuti Bhusan, Nakane, Kazuya, Ishikawa, Kenji, Sekine, Makoto, Tsutsumi, Takayoshi, Gohira, Taku, Ohya, Yoshinobu, Ohno, Noriyasu, Hori, Masaru
Published in Physical chemistry chemical physics : PCCP (08.06.2022)

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Journal Article

PLASMA ETCHING METHOD AND PLASMA ETCHING EQUIPMENT

PLASMA ETCHING METHOD AND PLASMA ETCHING EQUIPMENT

by GOHIRA TAKU, MINOURA YUYA
Year of Publication 29.08.2019

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Patent

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

by GOHIRA TAKU, NAKATANI MASAKO, SATO MASAHIRO
Year of Publication 02.12.2022

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Patent

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