Surface treatment against bromine defectivity in plasma etch reactor
Yoann, Goasduff, Nguyen, Marylaine, Patrice, Laurens, Distefano, Giuseppe
Published in 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) (01.05.2014)
Published in 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) (01.05.2014)
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Conference Proceeding
Comparison study between optical emission spectroscopy and x-ray photoelectron spectroscopy techniques during process etch plasma
Rizquez, Maria, Roussy, Agnès, James, Anthony, Pinaton, Jacques, Goasduff, Yoann
Published in 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) (01.05.2014)
Published in 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) (01.05.2014)
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Conference Proceeding
Method for producing an integrated circuit pointed element comprising etching first and second etchable materials with a particular etchant to form an open crater in a projection
Fornara, Pascal, Goasduff, Yoann, Marzaki, Abderrezak, Bidal, Virginie
Year of Publication 13.08.2019
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Year of Publication 13.08.2019
Patent