Enhancement of semiconductor wafer cleaning by chelating agent addition
GALE, Glenn W, RATH, David L, COOPER, Emanuel I, ESTES, Scott, OKORN-SCHMIDT, Harald F, BRIGANTE, Jeffrey, JAGANNATHAN, R, SETTEMBRE, Greg, ADAMS, Ed
Published in Journal of the Electrochemical Society (01.09.2001)
Published in Journal of the Electrochemical Society (01.09.2001)
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Journal Article
Novel photoresist stripping technology using ozone/vaporized water mixture
Abe, H., Iwamoto, H., Toshima, T., Iino, T., Gale, G.W.
Published in IEEE transactions on semiconductor manufacturing (01.08.2003)
Published in IEEE transactions on semiconductor manufacturing (01.08.2003)
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Journal Article
Conference Proceeding
An experimental study of megasonic cleaning of silicon wafers
BUSNAINA, A. A, KASHKOUSH, I. I, GALE, G. W
Published in Journal of the Electrochemical Society (01.08.1995)
Published in Journal of the Electrochemical Society (01.08.1995)
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Journal Article
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
KUSHIBIKI, MASATO, MURAKI, YUSUKE, SHINDO, NAOKI, HIROTA, YOSHIHIRO, SHIMIZU, AKITAKA, KATO, YOSHIHIRO, GLENN, GALE, ASHIGAKI, SHIGEO, NAKAMURA, GENJI
Year of Publication 06.07.2006
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Year of Publication 06.07.2006
Patent
Method and apparatus for pattern collapse free wet processing of semiconductor devices
SYOMIN DENIS, GALE GLENN W, FU QIAN, WILCOXSON MARK H, MIKHAYLICHENKO KATRINA, LIU SHENJIAN
Year of Publication 14.05.2013
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Year of Publication 14.05.2013
Patent
METHOD AND APPARATUS FOR PATTERN COLLAPSE FREE WET PROCESSING OF SEMICONDUCTOR DEVICES
WILCOXSON, MARK H, MIKHAYLICHENKO, KATRINA, GALE, GLENN W, FU, QIAN, SYOMIN, DENIS, LIU, SHENJIAN
Year of Publication 30.08.2012
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Year of Publication 30.08.2012
Patent