Glenn Gale, Vice President of SEZ's FEOL Cleaning Program, to Deliver Technical Keynote at Upcoming Conference
Published in PR Newswire
(09.02.2006)
Get full text
Newsletter
Enhancement of semiconductor wafer cleaning by chelating agent addition
GALE, Glenn W, RATH, David L, COOPER, Emanuel I, ESTES, Scott, OKORN-SCHMIDT, Harald F, BRIGANTE, Jeffrey, JAGANNATHAN, R, SETTEMBRE, Greg, ADAMS, Ed
Published in Journal of the Electrochemical Society (01.09.2001)
Published in Journal of the Electrochemical Society (01.09.2001)
Get full text
Journal Article
Novel photoresist stripping technology using ozone/vaporized water mixture
Abe, H., Iwamoto, H., Toshima, T., Iino, T., Gale, G.W.
Published in IEEE transactions on semiconductor manufacturing (01.08.2003)
Published in IEEE transactions on semiconductor manufacturing (01.08.2003)
Get full text
Journal Article
Conference Proceeding
An experimental study of megasonic cleaning of silicon wafers
BUSNAINA, A. A, KASHKOUSH, I. I, GALE, G. W
Published in Journal of the Electrochemical Society (01.08.1995)
Published in Journal of the Electrochemical Society (01.08.1995)
Get full text
Journal Article
METHOD OF PROCESSING A WAFER
SYOMIN DENIS, GALE GLENN W, FU QIAN, WILCOXSON MARK H, MIKHAYLICHENKO KATRINA, LIU SHENJIAN
Year of Publication 27.10.2017
Get full text
Year of Publication 27.10.2017
Patent
METHOD AND APPARATUS FOR PATTERN COLLAPSE FREE WET PROCESSING OF SEMICONDUCTOR DEVICES
SYOMIN DENIS, GALE GLENN W, FU QIAN, WILCOXSON MARK H, MIKHAYLICHENKO KATRINA, LIU SHENJIAN
Year of Publication 11.10.2012
Get full text
Year of Publication 11.10.2012
Patent