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"GAEBEL KAI"
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"GAEBEL KAI"
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INRICHTING VOOR DE OPWEKKING VAN EXTREEM ULTRAVIOLETTE STRALING UIT EEN ENERGIEBUNDEL-OPGEWEKT PLASMA MET EEN HOGE CONVERSIE EFFICIËNTIE EN MINIMALE VERVUILING
by
GAEBEL
,
KAI
,
KLOEPFEL, DIETHARD
Year of Publication
19.05.2010
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Arrangement for generating extreme ultraviolet radiation from a plasma generated by an energy beam with high conversion efficiency and minimum contamination
by
Kloepfel, Diethard
,
Gaebel
,
Kai
Year of Publication
06.10.2009
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Arrangement for generating extreme ultraviolet radiation from a plasma generated by an energy beam with high conversion efficiency and minimum contamination
by
KLOEPFEL DIETHARD
,
GAEBEL KAI
Year of Publication
06.10.2009
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Apparatus and method for production of extreme ultraviolet (EUV) radiation
by
GAEBEL
,
KAI
,
KLEINSCHMIDT, JUERGEN
Year of Publication
27.05.2009
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Device and method for generating extreme ultraviolet (EUV) radiation
by
KLEINSCHMIDT JUERGEN
,
GAEBEL KAI
Year of Publication
13.01.2009
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Device and method for generating extreme ultraviolet (EUV) radiation
by
Gaebel
,
Kai
,
Kleinschmidt, Juergen
Year of Publication
13.01.2009
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Anordnung zur Erzeugung von extrem ultravioletter Strahlung aus einem energiestrahlerzeugten Plasma mit hoher Konversionseffizienz und minimaler Kontamination
by
GAEBEL
,
KAI
,
KLOEPFEL, DIETHARD
Year of Publication
03.07.2008
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ARRANGEMENT FOR GENERATING EXTREME ULTRAVIOLET RADIATION FROM A PLASMA GENERATED BY AN ENERGY BEAM WITH HIGH CONVERSION EFFICIENCY AND MINIMUM CONTAMINATION
by
KLOEPFEL DIETHARD
,
GAEBEL KAI
Year of Publication
20.03.2008
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Collector mirror for plasma-based, short-wavelength radiation sources
by
BALOGH ISTVAN
,
GAEBEL KAI
Year of Publication
12.02.2008
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Collector mirror for plasma-based, short-wavelength radiation sources
by
Balogh, Istvan
,
Gaebel
,
Kai
Year of Publication
12.02.2008
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ARRANGEMENT FOR GENERATING EXTREME ULTRAVIOLET RADIATION FROM PLASMA GENERATED BY ENERGY BEAM WITH HIGH CONVERSION EFFICIENCY AND MINIMUM CONTAMINATION
by
KLOEPFEL DIETHARD
,
GAEBEL KAI
Year of Publication
01.11.2007
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Extreme ultraviolet radiation production arrangement for production of semiconductor chips, has injection unit with target nozzle for production of defined droplet size and drop sequence
by
GAEBEL
,
KAI
,
KLOEPFEL, DIETHARD
Year of Publication
18.10.2007
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COLLECTOR MIRROR FOR SHORT-WAVELENGTH RADIATION BASED ON PLASMA
by
BALOGH ISTVAN
,
GAEBEL KAI
Year of Publication
24.11.2006
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Collector mirror for plasma-based, short-wavelength radiation sources
by
BALOGH ISTVAN
,
GAEBEL KAI
Year of Publication
12.10.2006
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APPARATUS AND METHOD OF GENERATING EXTREME ULTRAVIOLET RAYS (EUV)
by
KLEINSCHMIDT JUERGEN
,
GAEBEL KAI
Year of Publication
07.09.2006
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Device and method for generating extreme ultraviolet (EUV) radiation
by
KLEINSCHMIDT JUERGEN
,
GAEBEL KAI
Year of Publication
31.08.2006
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Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Plasmas
by
ZIENER, CHRISTIAN
,
GAEBEL
,
KAI
,
HERGENHAN, GUIDO
Year of Publication
10.12.2009
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Device for x-ray radiography has portable laser- or electron-induced x-ray source of lateral dimension less than 100 microns, x-ray pulse length shorter than 10 picoseconds
by
LEBERT, RAINER
,
GAEBEL
,
KAI
Year of Publication
13.12.2001
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Arrangement for providing target material for the generation of short-wavelength electromagnetic radiation
by
ZIENER CHRISTIAN
,
HERGENHAN GUIDO
,
GAEBEL KAI
Year of Publication
29.07.2008
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Arrangement for providing target material for the generation of short-wavelength electromagnetic radiation
by
Hergenhan, Guido
,
Ziener, Christian
,
Gaebel
,
Kai
Year of Publication
29.07.2008
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