Plasma ash processing solutions for advanced interconnect technology
Fuller, N.C.M., Worsley, M.A., Tai, L., Bent, S., Labelle, C., Arnold, J., Dalton, T.
Published in Thin solid films (01.04.2008)
Published in Thin solid films (01.04.2008)
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Journal Article
Conference Proceeding
Post Implant Strip Optimization for 90nm and Beyond Technologies
Fuller, N.C.M., Santiago, A., Mello, K., Chienfan Yu, Molis, S.
Published in The 17th Annual SEMI/IEEE ASMC 2006 Conference (2006)
Published in The 17th Annual SEMI/IEEE ASMC 2006 Conference (2006)
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Conference Proceeding
Analysis of Plasma-Induced Modification of ULK and eULK Materials: Dual Damascene Processing Challenges for 45nm (K ⩽ 2.4) and Beyond BEOL Technologies
Fuller, N.C.M., Worsley, M.A., Nitta, S., Dalton, T., Tai, T.L., Bent, S., Magbitang, T., Dubois, G., Miller, R., Volksen, W., Sankar, M., Purushothaman, S.
Published in 2006 International Interconnect Technology Conference (2006)
Published in 2006 International Interconnect Technology Conference (2006)
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Conference Proceeding
Aggressively scaled (0.143 /spl mu/m/sup 2/) 6T-SRAM cell for the 32 nm node and beyond
Fried, D.M., Hergenrother, J.M., Topol, A.W., Chang, L., Sekaric, L., Sleight, J.W., McNab, S.J., Newbury, J., Steen, S.E., Gibson, G., Zhang, Y., Fuller, N.C.M., Bucchignano, J., Lavoie, C., Cabral Jr, C., Canaperi, D., Dokumaci, O., Frank, D.J., Duch, E.A., Babich, I., Wong, K., Ott, J.A., Adams, C.D., Dalton, T.J., Nunes, R., Medeiros, D.R., Viswanathan, R., Ketchen, M., Ieong, M., Haensch, W., Guarini, K.W.
Published in IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004 (2004)
Published in IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004 (2004)
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Conference Proceeding