X-ray Reflectivity Study on Depth Profile of Acid Generator Distribution in Chemically Amplified Resists
Fukuyama, Takehiro, Kozawa, Takahiro, Tagawa, Seiichi, Takasu, Ryoichi, Yukawa, Hiroto, Sato, Mitsuru, Onodera, Junichi, Hirosawa, Ichiro, Koganesawa, Tomoyuki, Horie, Kazuyuki
Published in Applied physics express (01.06.2008)
Published in Applied physics express (01.06.2008)
Get full text
Journal Article
Effect of Molecular Structure on Depth Profile of Acid Generator Distribution in Chemically Amplified Resist Films
Fukuyama, Takehiro, Kozawa, Takahiro, Okamoto, Kazumasa, Tagawa, Seiichi, Irie, Makiko, Mimura, Takeyoshi, Iwai, Takeshi, Onodera, Junichi, Hirosawa, Ichiro, Koganesawa, Tomoyuki, Horie, Kazuyuki
Published in Japanese Journal of Applied Physics (01.06.2009)
Published in Japanese Journal of Applied Physics (01.06.2009)
Get full text
Journal Article
Effect of Polymer Protection and Film Thickness on Acid Generator Distribution in Chemically Amplified Resists
Fukuyam, Takehiro, Kozawa, Takahiro, Yamamoto, Hiroki, Tagawa, Seiichi, Irie, Makiko, Mimura, Takeyoshi, Iwai, Takeshi, Onodera, Junichi, Hirosawa, Ichiro, Koganesawa, Tomoyuki, Horie, Kazuyuki
Published in Journal of Photopolymer Science and Technology (01.01.2009)
Published in Journal of Photopolymer Science and Technology (01.01.2009)
Get full text
Journal Article
분말 코팅용 수지 조성물
NOGUES ANTONI, CAPELOT MATHIEU, FUKUYAMA TAKEHIRO, CASADEVALL LLUIS, DEVISME SAMUEL
Year of Publication 06.09.2021
Get full text
Year of Publication 06.09.2021
Patent
플루오로폴리머 기반 분말 코팅
FINE THOMAS, FUKUYAMA TAKEHIRO, BONNET ANTHONY, ABGRALL FLORENT, DEVISME SAMUEL
Year of Publication 21.08.2019
Get full text
Year of Publication 21.08.2019
Patent