Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography
Yasuda, Masaaki, Koyama, Masanori, Fukunari, Kosai, Shirai, Masamitsu, Kawata, Hiroaki, Hirai, Yoshihiko
Published in Journal of Photopolymer Science and Technology (24.06.2019)
Published in Journal of Photopolymer Science and Technology (24.06.2019)
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