Layout modification method for exposure manufacturing process
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Year of Publication 28.02.2023
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Year of Publication 28.02.2023
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LAYOUT MODIFICATION METHOD FOR EXPOSURE MANUFACTURING PROCESS
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Year of Publication 23.09.2021
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Layout modification method for exposure manufacturing process
Chen, Chun-Kuang, Chen, Li-Jui, Cho, Hung-Wen, Lin, Chin-Hsiang, Shih, Chih-Tsung, Cheng, Po-Chung, Liang, Fu-Jye
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Year of Publication 01.06.2021
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METHOD AND APPARATUS FOR COLLECTING INFORMATION USED IN IMAGE-ERROR COMPENSATION
CHO, Hung-Wen, LIANG, Fu-Jye, CHEN, Li-Jui, CHEN, Chun-Kuang, LIN, Chin-Hsiang, SHIH, Chih-Tsung, CHENG, Po-Chung
Year of Publication 05.11.2020
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Year of Publication 05.11.2020
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LAYOUT MODIFICATION METHOD FOR EXPOSURE MANUFACTURING PROCESS
CHO, Hung-Wen, LIANG, Fu-Jye, CHEN, Li-Jui, CHEN, Chun-Kuang, LIN, Chin-Hsiang, SHIH, Chih-Tsung, CHENG, Po-Chung
Year of Publication 05.11.2020
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Year of Publication 05.11.2020
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METHOD OF CONTROLLING RETICLE MASKING BLADE POSITIONING TO MINIMIZE IMPACT ON CRITICAL DIMENSION UNIFORMITY AND DEVICE FOR CONTROLLING RETICLE MASKING BLADE POSITION
CHO, Hung-Wen, LIANG, Fu-Jye, CHEN, Li-Jui, CHEN, Chun-Kuang, LIN, Chin-Hsiang, SHIH, Chih-Tsung, CHENG, Po-Chung
Year of Publication 20.08.2020
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Year of Publication 20.08.2020
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Layout modification method for exposure manufacturing process
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Year of Publication 21.07.2020
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Year of Publication 21.07.2020
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Method and apparatus for collecting information used in image-error compensation
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Year of Publication 14.07.2020
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Year of Publication 14.07.2020
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Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning
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Year of Publication 05.05.2020
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Year of Publication 05.05.2020
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LAYOUT MODIFICATION METHOD FOR EXPOSURE MANUFACTURING PROCESS
CHO, Hung-Wen, LIANG, Fu-Jye, CHEN, Li-Jui, CHEN, Chun-Kuang, LIN, Chin-Hsiang, SHIH, Chih-Tsung, CHENG, Po-Chung
Year of Publication 14.11.2019
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Year of Publication 14.11.2019
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Layout modification method for exposure manufacturing process
Chen, Chun-Kuang, Chen, Li-Jui, Cho, Hung-Wen, Lin, Chin-Hsiang, Shih, Chih-Tsung, Cheng, Po-Chung, Liang, Fu-Jye
Year of Publication 30.07.2019
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Year of Publication 30.07.2019
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METHOD OF CONTROLLING RETICLE MASKING BLADE POSITIONING TO MINIMIZE IMPACT ON CRITICAL DIMENSION UNIFORMITY AND DEVICE FOR CONTROLLING RETICLE MASKING BLADE POSITIONING
CHO, Hung-Wen, LIANG, Fu-Jye, CHEN, Li-Jui, CHEN, Chun-Kuang, LIN, Chin-Hsiang, SHIH, Chih-Tsung, CHENG, Po-Chung
Year of Publication 30.05.2019
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Year of Publication 30.05.2019
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METHOD AND APPARATUS FOR COLLECTING INFORMATION USED IN IMAGE-ERROR COMPENSATION
CHO, Hung-Wen, LIANG, Fu-Jye, CHEN, Li-Jui, CHEN, Chun-Kuang, LIN, Chin-Hsiang, SHIH, Chih-Tsung, CHENG, Po-Chung
Year of Publication 09.05.2019
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Year of Publication 09.05.2019
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LAYOUT MODIFICATION METHOD FOR EXPOSURE MANUFACTURING PROCESS
CHO, Hung-Wen, LIANG, Fu-Jye, CHEN, Li-Jui, CHEN, Chun-Kuang, LIN, Chin-Hsiang, SHIH, Chih-Tsung, CHENG, Po-Chung
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Year of Publication 02.05.2019
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Lithography process and system with enhanced overlay quality
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Year of Publication 04.12.2018
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Year of Publication 09.03.2010
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