METHODS OF FORMING EPITAXIAL SEMICONDUCTOR MATERIAL ON SOURCE/DRAIN REGIONS OF A FINFET SEMICONDUCTOR DEVICE AND THE RESULTING DEVICES
FRONHEISER JODY A, JACOB AJEY POOVANNUMMOOTTIL, LIU JINPING, AKARVARDAR MURAT KEREM, KRISHNAN BHARAT V, BENTLEY STEVEN
Year of Publication 05.08.2015
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Year of Publication 05.08.2015
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METHOD OF FORMING FINFET DEVICES WITH ALTERNATIVE CHANNEL MATERIALS
MASZARA WITOLD P, FRONHEISER JODY A, AKARVARDAR KEREM, JACOB AJEY P, LICAUSI NICHOLAS V
Year of Publication 29.11.2013
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Year of Publication 29.11.2013
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INTEGRATING STRAIN SiGe CHANNEL PMOS FOR GAA CMOS TECHNOLOGY
YEONG, Sai Hooi, BAZIZI, El Mehdi, PAL, Ashish, FRONHEISER, Jody A, PRANATHARTHIHARAN, Balasubramanian, COLOMBEAU, Benjamin
Year of Publication 18.01.2024
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Year of Publication 18.01.2024
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INTEGRATING STRAIN SiGe CHANNEL PMOS FOR GAA CMOS TECHNOLOGY
Pranatharthiharan, Balasubramanian, Yeong, Sai Hooi, Bazizi, El Mehdi, Fronheiser, Jody A, Pal, Ashish, Colombeau, Benjamin
Year of Publication 11.01.2024
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Year of Publication 11.01.2024
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UNIFORM SIGE CHANNEL IN NANOSHEET ARCHITECTURE
Yeong, Sai Hooi, Fronheiser, Jody A, Li, Ning, Labonte, Andre P, Shepard, JR., Joseph Francis, Collins, David
Year of Publication 15.08.2024
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Year of Publication 15.08.2024
Patent
UNIFORM SIGE CHANNEL IN NANOSHEET ARCHITECTURE
LI, Ning, YEONG, Sai Hooi, SHEPARD, Joseph Francis, FRONHEISER, Jody A, LABONTE, Andre P, COLLINS, David
Year of Publication 15.08.2024
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Year of Publication 15.08.2024
Patent
a-Si/c-Si interfaces: The effect of annealing and film thickness
Zhang, Xiaolan, Fronheiser, Jody A., Korevaar, Bas A., Tolliver, Todd R.
Published in 2008 33rd IEEE Photovoltaic Specialists Conference (01.05.2008)
Published in 2008 33rd IEEE Photovoltaic Specialists Conference (01.05.2008)
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Conference Proceeding
Common fabrication of multiple FinFETs with different channel heights
Fronheiser, Jody A, Akarvardar, Murat Kerem, Jacob, Ajey Poovannummoottil
Year of Publication 01.05.2018
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Year of Publication 01.05.2018
Patent
Electrical isolation of FinFET active region by selective oxidation of sacrificial layer
Fronheiser Jody A, Jacob Ajey Poovannummoottil, Akarvardar Murat Kerem
Year of Publication 25.07.2017
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Year of Publication 25.07.2017
Patent