Step pinning and hillock formation in (Al,Ga)N films on native AlN substrates
Schulz, T., Yoo, S.-H., Lymperakis, L., Richter, C., Zatterin, E., Lachowski, A., Hartmann, C., Foronda, H. M., Brandl, C., Lugauer, H. J., Hoffmann, M. P., Albrecht, M.
Published in Journal of applied physics (14.12.2022)
Published in Journal of applied physics (14.12.2022)
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