Electrical characterization of single nanometer-wide Si fins in dense arrays
Folkersma, Steven, Bogdanowicz, Janusz, Schulze, Andreas, Favia, Paola, Petersen, Dirch H, Hansen, Ole, Henrichsen, Henrik H, Nielsen, Peter F, Shiv, Lior, Vandervorst, Wilfried
Published in Beilstein journal of nanotechnology (2018)
Published in Beilstein journal of nanotechnology (2018)
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Journal Article
Low temperature epitaxial growth of Ge:B and Ge0.99Sn0.01:B source/drain for Ge pMOS devices: in-situ and conformal B-doping, selectivity towards oxide and nitride with no need for any post-epi activation treatment
Vohra, Anurag, Porret, Clement, Kohen, David, Folkersma, Steven, Bogdanowicz, Janusz, Schaekers, Marc, Tolle, John, Hikavyy, Andriy, Capogreco, Elena, Witters, Liesbeth, Langer, Robert, Vandervorst, Wilfried, Loo, Roger
Published in Japanese Journal of Applied Physics (01.04.2019)
Published in Japanese Journal of Applied Physics (01.04.2019)
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Journal Article
Electrical Contact Formation in Micro Four‐Point Probe Measurements
Folkersma, Steven, Bogdanowicz, Janusz, Petersen, Dirch H., Hansen, Ole, Henrichsen, Henrik H., Nielsen, Peter F., Shiv, Lior, Vandervorst, Wilfried
Published in Physica status solidi. A, Applications and materials science (01.03.2020)
Published in Physica status solidi. A, Applications and materials science (01.03.2020)
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Journal Article
Width‐Dependent Sheet Resistance of Nanometer‐Wide Si Fins as Measured with Micro Four‐Point Probe
Bogdanowicz, Janusz, Folkersma, Steven, Sergeant, Stefanie, Schulze, Andreas, Moussa, Alain, Petersen, Dirch H., Hansen, Ole, Henrichsen, Henrik H., Nielsen, Peter F., Vandervorst, Wilfried
Published in Physica status solidi. A, Applications and materials science (21.03.2018)
Published in Physica status solidi. A, Applications and materials science (21.03.2018)
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Journal Article
Low temperature epitaxial growth of Ge:B and Ge 0.99 Sn 0.01 :B source/drain for Ge pMOS devices: in-situ and conformal B-doping, selectivity towards oxide and nitride with no need for any post-epi activation treatment
Vohra, Anurag, Porret, Clement, Kohen, David, Folkersma, Steven, Bogdanowicz, Janusz, Schaekers, Marc, Tolle, John, Hikavyy, Andriy, Capogreco, Elena, Witters, Liesbeth, Langer, Robert, Vandervorst, Wilfried, Loo, Roger
Published in Japanese Journal of Applied Physics (01.04.2019)
Published in Japanese Journal of Applied Physics (01.04.2019)
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Journal Article
Towards Carrier Profiling in Nanometer-wide Si Fins with Micro Four-Point Probe
Folkersma, Steven, Bogdanowicz, Janusz, Schulze, Andreas, Favia, Paola, Franquet, Alexis, Spampinato, Valentina, Petersen, Dirch H., Hansen, Ole, Henrichsen, Henrik H., Nielsen, Peter F., Shiv, Lior, Vandervorst, Wilfried
Published in 2018 22nd International Conference on Ion Implantation Technology (IIT) (01.09.2018)
Published in 2018 22nd International Conference on Ion Implantation Technology (IIT) (01.09.2018)
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Conference Proceeding