Ultralow k using a plasma enhanced chemical vapor deposition porogen approach: Matrix structure and porogen loading influences
Favennec, Laurent, Jousseaume, Vincent, Gerbaud, Guillaume, Zenasni, Aziz, Passemard, Gérard
Published in Journal of applied physics (15.09.2007)
Published in Journal of applied physics (15.09.2007)
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Journal Article
The role of ultraviolet radiation during ultralow k films curing: Strengthening mechanisms and sacrificial porogen removal
Zenasni, Aziz, Jousseaume, Vincent, Holliger, Philippe, Favennec, Laurent, Gourhant, Olivier, Maury, Patrick, Gerbaud, Guillaume
Published in Journal of applied physics (01.11.2007)
Published in Journal of applied physics (01.11.2007)
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Journal Article
Spin-coated and PECVD low dielectric constant porous organosilicate films studied by 1D and 2D solid-state NMR
GERBAUD, Guillaume, HEDIGER, Sabine, BARDET, Michel, FAVENNEC, Laurent, ZENASNI, Aziz, BEYNET, Julien, GOURHANT, Olivier, JOUSSEAUME, Vincent
Published in Physical chemistry chemical physics : PCCP (01.01.2009)
Published in Physical chemistry chemical physics : PCCP (01.01.2009)
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Journal Article
Innovative Gap-Fill Strategy for 28 nm Shallow Trench Isolation
Tavernier, Aurélien, Favennec, Laurent, Chevolleau, Thierry, Jousseaume, Vincent
Published in ECS transactions (27.04.2012)
Published in ECS transactions (27.04.2012)
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Journal Article
18nm FDSOI Technology Platform embedding PCM & Innovative Continuous-Active Construct Enhancing Performance for Leading-Edge MCU Applications
Min, Doohong, Park, Jinha, Weber, Olivier, Wacquant, Francois, Villaret, Alexandre, Vandenbossche, Eric, Arnaud, Franck, Bernard, Emilie, Elghouli, Salim, Boccaccio, Christian, Favennec, Laurent, Gonella, Roberto, Galvier, Jean, Yun, Jiyoung, Park, Jinwoo, Lee, Minuk, Yoon, Pyeongjun, Lee, Ilmin, Seo, Heaseok, Choi, Hoonsung, Oh, Changbong, Kang, Jinseok, Park, Sewan, Lee, Hyunjong, Choi, Youngju, Kim, Inwhan, Jo, Joohyun, Park, Yoonsoo, Park, Jinchan, Lee, Youngja, Jung, Jinhyeok, Lee, Juwon, Jang, Hana, Kang, Jihun, Kwon, Jisoo, Kim, Joochan, Maeda, Shigenobu, Hong, Youngki
Published in 2021 IEEE International Electron Devices Meeting (IEDM) (11.12.2021)
Published in 2021 IEEE International Electron Devices Meeting (IEDM) (11.12.2021)
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Conference Proceeding
CHIP CONTAINING AN ONBOARD NON-VOLATILE MEMORY COMPRISING A PHASE-CHANGE MATERIAL
BRUN, Philippe, ODDOU, Jean-Pierre, BROUSSOUS, Lucile, ZOLL, Stephane, HINSINGER, Olivier, WEBER, Olivier, BOIVIN, Philippe, GALPIN, David, FAVENNEC, Laurent, ARNAUD, Franck, MORIN, Pierre
Year of Publication 17.08.2023
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Year of Publication 17.08.2023
Patent
Chip containing an onboard non-volatile memory comprising a phase-change material
Oddou, Jean-Pierre, Favennec, Laurent, Brun, Philippe, Morin, Pierre, Arnaud, Franck, Hinsinger, Olivier, Weber, Olivier, Zoll, Stephane, Broussous, Lucile, Galpin, David, Boivin, Philippe
Year of Publication 16.05.2023
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Year of Publication 16.05.2023
Patent