In-line Si1-xGex epitaxial process monitoring and diagnostics using multiwavelength high resolution micro-Raman spectroscopy
Chang, Chun-Wei, Hong, Min-Hao, Lee, Wei-Fan, Lee, Kuan-Ching, Yang, Shen-Min, Tsai, Ming-Shan, Chuang, Yen, Fan, Yu-Ta, Hasuike, Noriyuki, Harima, Hiroshi, Ueda, Takeshi, Ishigaki, Toshikazu, Kang, Kitaek, Yoo, Woo Sik
Published in AIP advances (01.06.2012)
Published in AIP advances (01.06.2012)
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Journal Article
Contactless monitoring of Ge content and B concentration in ultrathin single and double layer Si1-xGex epitaxial films using multiwavelength micro-Raman spectroscopy
Chang, Chun-Wei, Hong, Min-Hao, Lee, Wei-Fan, Lee, Kuan-Ching, Jang Jian, Shiu-Ko, Chuang, Yen, Fan, Yu-Ta, Hasuike, Noriyuki, Harima, Hiroshi, Ueda, Takeshi, Ishigaki, Toshikazu, Kang, Kitaek, Sik Yoo, Woo
Published in AIP advances (01.03.2012)
Published in AIP advances (01.03.2012)
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Journal Article
Non-contact monitoring of Ge and B diffusion in B-doped epitaxial Si1-xGex bi-layers on silicon substrates during rapid thermal annealing by multiwavelength Raman spectroscopy
Hong, Min-Hao, Chang, Chun-Wei, Perng, Dung-Ching, Lee, Kuan-Ching, Jian, Shiu-Ko Jang, Lee, Wei-Fan, Chuang, Yen, Fan, Yu-Ta, Yoo, Woo Sik
Published in AIP advances (01.09.2012)
Published in AIP advances (01.09.2012)
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Journal Article
Micro-Raman characterization of Ge diffusion and Si stress change in thin epitaxial Si1−xGex layers on Si(100) after rapid thermal annealing
Chang, Chun-Wei, Hong, Min-Hao, Lee, Wei-Fan, Lee, Kuan-Ching, Tseng, Li-De, Chen, Yi-Hann, Chuang, Yen, Fan, Yu-Ta, Ueda, Takeshi, Ishigaki, Toshikazu, Kang, Kitaek, Yoo, Woo Sik
Published in Journal of materials research (14.05.2012)
Published in Journal of materials research (14.05.2012)
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Journal Article
Micro-Raman characterization of Ge diffusion and Si stress change in thin epitaxial Si 1− x Ge x layers on Si(100) after rapid thermal annealing
Chang, Chun-Wei, Hong, Min-Hao, Lee, Wei-Fan, Lee, Kuan-Ching, Tseng, Li-De, Chen, Yi-Hann, Chuang, Yen, Fan, Yu-Ta, Ueda, Takeshi, Ishigaki, Toshikazu, Kang, Kitaek, Yoo, Woo Sik
Published in Journal of materials research (14.05.2012)
Published in Journal of materials research (14.05.2012)
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Journal Article
Multiwavelength Micro-Raman Characterization of Epitaxial Si1−x Ge x Layers on Si(100) and In-Line Process Monitoring Applications
Chang, Chun-Wei, Hong, Min-Hao, Tsai, Ming-Shan, Lee, Kuan-Ching, Lee, Wei-Fan, Chuang, Yen, Fan, Yu-Ta, Ueda, Takeshi, Ishigaki, Toshikazu, Kang, Kitaek, Yoo, Woo Sik
Published in Journal of electronic materials (01.11.2012)
Published in Journal of electronic materials (01.11.2012)
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Journal Article
Multiwavelength Micro-Raman Characterization of Epitaxial Si^sub 1-x^Ge^sub x^ Layers on Si(100) and In-Line Process Monitoring Applications
Chang, Chun-wei, Hong, Min-hao, Tsai, Ming-shan, Lee, Kuan-ching, Lee, Wei-fan, Chuang, Yen, Fan, Yu-ta, Ueda, Takeshi, Ishigaki, Toshikazu, Kang, Kitaek, Yoo, Woo Sik
Published in Journal of electronic materials (01.11.2012)
Published in Journal of electronic materials (01.11.2012)
Get full text
Journal Article
Multiwavelength Micro-Raman Characterization of Epitaxial Si1−xGex Layers on Si(100) and In-Line Process Monitoring Applications
Chang, Chun-Wei, Hong, Min-Hao, Tsai, Ming-Shan, Lee, Kuan-Ching, Lee, Wei-Fan, Chuang, Yen, Fan, Yu-Ta, Ueda, Takeshi, Ishigaki, Toshikazu, Kang, Kitaek, Yoo, Woo Sik
Published in Journal of electronic materials (2012)
Published in Journal of electronic materials (2012)
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Journal Article
Contactless monitoring of Ge content and B concentration in ultrathin single and double layer Si{sub 1-x}Ge{sub x} epitaxial films using multiwavelength micro-Raman spectroscopy
Chang, Chun-Wei, Hong, Min-Hao, Lee, Wei-Fan, Lee, Kuan-Ching, Jang Jian, Shiu-Ko, Chuang, Yen, Fan, Yu-Ta, Hasuike, Noriyuki, Harima, Hiroshi, Ueda, Takeshi, Ishigaki, Toshikazu, Kang, Kitaek, Sik Yoo, Woo
Published in AIP advances (15.03.2012)
Published in AIP advances (15.03.2012)
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Journal Article