Line edge roughness investigation on chemically amplified resist materials with masked helium ion beam lithography
EDER-KAPL, Stefan, LOESCHNER, Hans, ZEININGER, Michalea, FALLMANN, Wolfgang, KIRCH, Oliver, PATSIS, George P, CONSTANTOUDIS, V, GOGOLIDES, Evangelos
Published in Microelectronic engineering (01.06.2004)
Published in Microelectronic engineering (01.06.2004)
Get full text
Conference Proceeding
Journal Article
Line edge roughness investigation on chemically amplified resist materials with masked helium ion beam lithography
Eder-Kapl, Stefan, Loeschner, Hans, Zeininger, Michalea, Fallmann, Wolfgang, Kirch, Oliver, Patsis, George P., Constantoudis, V., Gogolides, Evangelos
Published in Microelectronic engineering (01.06.2004)
Published in Microelectronic engineering (01.06.2004)
Get full text
Journal Article
ELECTRODE-TYPE REACTOR FOR PRODUCING MULTILAYER THIN FILM STRUCTURES OF DIELECTRIC-SEMICONDUCTOR TYPE
TYCZKOWSKI JACEK, OLCAYTUG FETHI, FALLMANN WOLFGANG, KAZIMIERSKI PIOTR
Year of Publication 30.08.1996
Get full text
Year of Publication 30.08.1996
Patent
ELECTRODE-TYPE REACTOR FOR PRODUCING MULTILAYER THIN FILM STRUCTURES OF DIELECTRIC-SEMICONDUCTOR TYPE
TYCZKOWSKI JACEK, OLCAYTUG FETHI, FALLMANN WOLFGANG, KAZIMIERSKI PIOTR
Year of Publication 30.05.1994
Get full text
Year of Publication 30.05.1994
Patent
METHOD FOR PRODUCING A STRUCTURED LAYER
SLEYTR, UWE, B, LOESCHNER, HANS, PUM, DIETMAR, FALLMANN, WOLFGANG, STANGL, GUENTHER
Year of Publication 11.09.1998
Get full text
Year of Publication 11.09.1998
Patent