Lithographic and pattern transfer of a novel deep-UV photoresist: ARCH2
Falcigno, P., Münzel, N., Holzwarth, H., Schacht, H.-T., Mertesdorf, C., Bronner, W., Kaufel, G., Timko, A., Nalamasu, O.
Published in Microelectronic engineering (01.01.1996)
Published in Microelectronic engineering (01.01.1996)
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Conference Proceeding
A unified approach to resist materials design for the advanced lithographic technologies
NALAMASU, O, REICHMANIS, E, TIMKO, A. G, TARASCON, R, NOVEMBRE, A. E, SLATER, S, HOLZWARTH, H, FALCIGNO, P, MÜNZEL, N
Published in Microelectronic engineering (01.02.1995)
Published in Microelectronic engineering (01.02.1995)
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Conference Proceeding
Cation binding at the air-water interface by macromolecules bearing pendant crown ethers moieties
Gold, Jeffrey M, Teegarden, David M, McGrane, Kathleen M, Luca, David J, Falcigno, Pasquale A, Chen, Cindy C, Smith, Thomas W
Published in Journal of the American Chemical Society (01.09.1986)
Published in Journal of the American Chemical Society (01.09.1986)
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