Development of Microwave-Excited Plasma-Enhanced Metal–Organic Chemical Vapor Deposition System for Forming Ferroelectric Sr 2 (Ta 1-x ,Nb x ) 2 O 7 Thin Film on Amorphous SiO 2
Takahashi, Ichirou, Funaiwa, Kiyoshi, Azumi, Keita, Yamashita, Satoru, Shirai, Yasuyuki, Hirayama, Masaki, Teramoto, Akinobu, Sugawa, Shigetoshi, Ohmi, Tadahiro
Published in Japanese Journal of Applied Physics (01.04.2007)
Published in Japanese Journal of Applied Physics (01.04.2007)
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Journal Article
A Low-Dielectric-Constant Sr 2 (Ta 1-x ,Nb x ) 2 O 7 Thin Film Controlling the Crystal Orientation on an IrO 2 Substrate for One-Transistor-Type Ferroelectric Memory Device
Takahashi, Ichirou, Sakurai, Hiroyuki, Yamada, Atsuhiko, Funaiwa, Kiyoshi, Goto, Tetsuya, Hirayama, Masaki, Teramoto, Akinobu, Sugawa, Shigetoshi, Ohmi, Tadahiro
Published in Japanese Journal of Applied Physics (01.04.2004)
Published in Japanese Journal of Applied Physics (01.04.2004)
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Journal Article
MFIS Structure Device with a Low Dielectric Constant Ferroelectric Sr2(Ta1−x,Nbx)2O7 Formed by Plasma Physical Vapor Deposition and Oxygen Radical Treatment
TAKAHASHI, ICHIROU, SAKURAI, HIROYUKI, ISOGAI, TATSUFUMI, FUNAIWA, KIYOSHI, HIRAYAMA, MASAKI, TERAMOTO, AKINOBU, SUGAWA, SHIGETOSHI, OHMI, TADAHIRO
Published in Integrated ferroelectrics (01.01.2004)
Published in Integrated ferroelectrics (01.01.2004)
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Journal Article
MFIS Structure Device with a Low Dielectric Constant Ferroelectric Sr 2 (Ta 1−x ,Nb x ) 2 O 7 Formed by Plasma Physical Vapor Deposition and Oxygen Radical Treatment
TAKAHASHI, ICHIROU, SAKURAI, HIROYUKI, ISOGAI, TATSUFUMI, FUNAIWA, KIYOSHI, HIRAYAMA, MASAKI, TERAMOTO, AKINOBU, SUGAWA, SHIGETOSHI, OHMI, TADAHIRO
Published in Integrated ferroelectrics (01.01.2004)
Published in Integrated ferroelectrics (01.01.2004)
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Journal Article
Oxygen radical treatment applied to ferroelectric thin films
Takahashi, Ichirou, Sakurai, Hiroyuki, Yamada, Atsuhiko, Funaiwa, Kiyoshi, Hirai, Kentarou, Urabe, Shinichi, Goto, Tetsuya, Hirayama, Masaki, Teramoto, Akinobu, Sugawa, Shigetoshi, Ohmi, Tadahiro
Published in Applied surface science (30.06.2003)
Published in Applied surface science (30.06.2003)
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Conference Proceeding
FERROELECTRIC Sr2(Ta1-x, Nbx)2O7 WITH A LOW DIELECTRIC CONSTANT BY PLASMA PHYSICAL VAPOR DEPOSITION AND OXYGEN RADICAL TREATMENT
Takahashi, I, Sakurai, H, Yamada, A, Funaiwa, K, Hirai, K, Urabe, S, Goto, T
Published in Japanese Journal of Applied Physics, Part 1 (01.01.2003)
Published in Japanese Journal of Applied Physics, Part 1 (01.01.2003)
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Journal Article
Ferroelectric Sr 2 (Ta 1- x , Nb x ) 2 O 7 with a Low Dielectric Constant by Plasma Physical Vapor Deposition and Oxygen Radical Treatment
Takahashi, Ichirou, Sakurai, Hiroyuki, Yamada, Atsuhiko, Funaiwa, Kiyoshi, Hirai, Kentaro, Urabe, Shinichi, Goto, Tetsuya, Hirayama, Masaki, Teramoto, Akinobu, Sugawa, Shigetoshi, Ohmi, Tadahiro
Published in Japanese Journal of Applied Physics (30.04.2003)
Published in Japanese Journal of Applied Physics (30.04.2003)
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Journal Article