Kinetic study on heterogeneous nucleation and incubation period during chemical vapor deposition
Shima, Kohei, Otaka, Yuhei, Sato, Noboru, Funato, Yuichi, Fukushima, Yasuyuki, Momose, Takeshi, Shimogaki, Yukihiro
Published in The Journal of chemical physics (28.03.2023)
Published in The Journal of chemical physics (28.03.2023)
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Journal Article
In situ gold adsorption experiment at an acidic hot spring using a blue-green algal sheet
Nozaki, Tatsuo, Fukushima, Yasuyuki, Okada, Satoshi, Takaya, Yutaro, Makabe, Akiko, Watanabe, Masayuki
Published in Scientific reports (08.03.2024)
Published in Scientific reports (08.03.2024)
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Journal Article
Separate evaluation of multiple film-forming species in chemical vapor deposition of SiC using high aspect-ratio microchannels
Shima, Kohei, Sato, Noboru, Funato, Yuichi, Fukushima, Yasuyuki, Momose, Takeshi, Shimogaki, Yukihiro
Published in Japanese Journal of Applied Physics (01.06.2017)
Published in Japanese Journal of Applied Physics (01.06.2017)
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Journal Article
Multiscale analysis of silicon carbide-chemical vapor deposition process
Fukushima, Yasuyuki, Hotozuka, Kozue, Shimogaki, Yukihiro
Published in Journal of nanoscience and nanotechnology (01.09.2011)
Published in Journal of nanoscience and nanotechnology (01.09.2011)
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Journal Article
High-Aspect-Ratio Parallel-Plate Microchannels Applicable to Kinetic Analysis of Chemical Vapor Deposition
Shima, Kohei, Funato, Yuichi, Sugiura, Hidetoshi, Sato, Noboru, Fukushima, Yasuyuki, Momose, Takeshi, Shimogaki, Yukihiro
Published in Advanced materials interfaces (01.08.2016)
Published in Advanced materials interfaces (01.08.2016)
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Journal Article
The Photo-absorption Coefficient Measurement of EUV Resist
Fukushima, Yasuyuki, Watanabe, Takeo, Harada, Tetuo, Kinoshita, Hiroo
Published in Journal of Photopolymer Science and Technology (01.01.2009)
Published in Journal of Photopolymer Science and Technology (01.01.2009)
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Journal Article
Imaging Performance Improvement of an Extreme Ultraviolet Microscope
Takase, Kei, Kamaji, Yoshito, Sakagami, Naoki, Iguchi, Takafumi, Tada, Masaki, Yamaguchi, Yuya, Fukushima, Yasuyuki, Harada, Tetsuo, Watanabe, Takeo, Kinoshita, Hiroo
Published in Japanese Journal of Applied Physics (01.06.2010)
Published in Japanese Journal of Applied Physics (01.06.2010)
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Journal Article
Development of Extreme Ultraviolet Interference Lithography System
Fukushima, Yasuyuki, Sakagami, Naoki, Kimura, Teruhiko, Kamaji, Yoshito, Iguchi, Takafumi, Yamaguchi, Yuya, Tada, Masaki, Harada, Tetsuo, Watanabe, Takeo, Kinoshita, Hiroo
Published in Japanese Journal of Applied Physics (01.06.2010)
Published in Japanese Journal of Applied Physics (01.06.2010)
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Journal Article
EUV Interference Lithography for 1X nm
Urayama, Takuro, Watanabe, Takeo, Yamaguchi, Yuya, Matsuda, Naohiro, Fukushima, Yasuyuki, Iguchi, Takafumi, Harada, Tetsuo, Kinoshita, Hiroo
Published in Journal of Photopolymer Science and Technology (01.01.2011)
Published in Journal of Photopolymer Science and Technology (01.01.2011)
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Journal Article
Fabrication Process of EUV-IL Transmission Grating
Yamguchi, Yuya, Fukushima, Yasuyuki, Iguchi, Tekafumi, Kinoshita, Hiroo, Harada, Tetsuo, Watanabe, Takeo
Published in Journal of Photopolymer Science and Technology (01.01.2010)
Published in Journal of Photopolymer Science and Technology (01.01.2010)
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Journal Article
Decomposition and Roughness Analysis of Chemically Amplified Molecular Resist for Reducing Line Width Roughness
Shiono, Daiju, Hada, Hideo, Sato, Kazufumi, Fukushima, Yasuyuki, Watanabe, Takeo, Kinoshita, Hiroo
Published in Japanese Journal of Applied Physics (01.06.2010)
Published in Japanese Journal of Applied Physics (01.06.2010)
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Journal Article
EUV Interference Lithography for 22 nm Node and Below
Fukushima, Yasunari, Yamaguchi, Yuya, Kimura, Teruhiko, Iguchi, Takafumi, Harada, Tetsuo, Watanabe, Takeo, Kinoshita, Hiroo
Published in Journal of Photopolymer Science and Technology (01.01.2010)
Published in Journal of Photopolymer Science and Technology (01.01.2010)
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Journal Article