Effective sticking coefficient measurement of radicals for a-SIN:H film growth in plasma CVD
Fujikake, Shinji, Narita, Masataka, Ichikawa, Yukimi
Published in Electrical engineering in Japan (01.08.2006)
Published in Electrical engineering in Japan (01.08.2006)
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Journal Article
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
MURATA KOICHI, FUJIKAKE SHINJI, TSUCHIDA SHUICHI, TAWARA TAE, TAKIGAWA AKI
Year of Publication 18.03.2021
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Year of Publication 18.03.2021
Patent
Improved Field Effect Mobility in Si-Face 4H-SiC MOSFETs with a Deposited SiNx Interface Layer
Okumura, Hajime, Okamoto, Mitsuo, Tawara, Tae, Harada, Shinsuke, Iijima, Miwako, Araoka, Tuyoshi, Iwahashi, Yohei, Kumazawa, Teruaki, Kimura, Hiroshi, Hamada, Kimimori, Fujikake, Shinji
Published in Materials science forum (19.07.2019)
Published in Materials science forum (19.07.2019)
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Journal Article
DB (Dielectric Barrier) IGBT with extreme injection enhancement
Takei, Manabu, Fujikake, Shinji, Nakazawa, Haruo, Naito, Tatsuya, Kawashima, Tomoyuki, Shimoyama, Kazuo, Kuribayashi, Hitoshi
Published in 2010 22nd International Symposium on Power Semiconductor Devices & IC's (ISPSD) (01.06.2010)
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Published in 2010 22nd International Symposium on Power Semiconductor Devices & IC's (ISPSD) (01.06.2010)
Conference Proceeding
Semiconductor device and method of manufacturing semiconductor device
Takigawa, Aki, Fujikake, Shinji, Tawara, Tae, Murata, Koichi, Tsuchida, Hidekazu
Year of Publication 23.11.2021
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Year of Publication 23.11.2021
Patent
Working Pressure Effects on Deposition of Large-Area Microcrystalline Silicon Films on Flexible Plastic Substrate at 130°C
Takano, Akihiro, Wada, Takehito, Shimosawa, Makoto, Fujikake, Shinji, Yoshida, Takashi
Published in Japanese Journal of Applied Physics (15.09.2002)
Published in Japanese Journal of Applied Physics (15.09.2002)
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Journal Article
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
TAWARA, Tae, TAKIGAWA, Aki, MURATA, Koichi, FUJIKAKE, Shinji, TSUCHIDA, Hidekazu
Year of Publication 11.03.2021
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Year of Publication 11.03.2021
Patent