Automated computer-based detection of encounter behaviours in groups of honeybees
Blut, Christina, Crespi, Alessandro, Mersch, Danielle, Keller, Laurent, Zhao, Linlin, Kollmann, Markus, Schellscheidt, Benjamin, Fülber, Carsten, Beye, Martin
Published in Scientific reports (15.12.2017)
Published in Scientific reports (15.12.2017)
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Photolithographic process and mask therefor
WIDMANN, DIETRICH, FRIEDRICH, CHRISTOPH, FUELBER, CARSTEN, KAESMAIER, RAINER, CZECH, GUENTHER
Year of Publication 09.06.2004
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Year of Publication 09.06.2004
Patent
Method for photolithographic structuring by means of a carbon hard mask layer which has a diamond-like hardness and is produced by means of a plasma-enhanced deposition method
STEGEMANN, MAIK, VOGT, MIRKO, FUELBER, CARSTEN, KIRCHHOFF, MARKUS, CZECH, GUENTHER
Year of Publication 11.04.2004
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Year of Publication 11.04.2004
Patent
Lithography method and lithography mask
KAESMAIER RAINER, FRIEDRICH CHRISTOPH, WIDMANN DIETRICH, CZECH GUENTHER, FUELBER CARSTEN
Year of Publication 03.02.2004
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Year of Publication 03.02.2004
Patent
METHOD FOR PHOTOLITHOGRAPHIC STRUCTURING BY MEANS OF A CARBON HARD MASK LAYER WHICH HAS A DIAMOND-LIKE HARDNESS AND IS PRODUCED BY MEANS OF A PLASMA-ENHANCED DEPOSITION METHOD
STEGEMANN, MAIK, WEGE, STEPHAN, VOGT, MIRKO, FUELBER, CARSTEN, KIRCHHOFF, MARKUS, CZECH, GUENTHER
Year of Publication 24.01.2007
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Year of Publication 24.01.2007
Patent
Photolithographic process and mask therefor
WIDMANN, DIETRICH, FRIEDRICH, CHRISTOPH, FUELBER, CARSTEN, KAESMAIER, RAINER, CZECH, GUENTHER
Year of Publication 10.07.2002
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Year of Publication 10.07.2002
Patent
Lithographic process for structuring layers during the manufacture of integrated circuits comprises guiding radiation emitted by a radiation source and lying in the extreme UV range onto photosensitive layers via a mask
WIDMANN, DIETRICH, FRIEDRICH, CHRISTOPH, FUELBER, CARSTEN, KAESMAIER, RAINER, CZECH, GUENTHER
Year of Publication 21.06.2001
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Year of Publication 21.06.2001
Patent
METHOD FOR PHOTOLITHOGRAPHIC STRUCTURING BY MEANS OF A CARBON HARD MASK LAYER WHICH HAS A DIAMOND-LIKE HARDNESS AND IS PRODUCED BY MEANS OF A PLASMA-ENHANCED DEPOSITION METHOD
STEGEMANN, MAIK, WEGE, STEPHAN, VOGT, MIRKO, FUELBER, CARSTEN, KIRCHHOFF, MARKUS, CZECH, GUENTHER
Year of Publication 11.08.2004
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Year of Publication 11.08.2004
Patent
Lithograph method and mask to its application
FUELBER, CARSTEN DR, WIDMANN, DIETRICH, FRIEDRICH, CHRISTOPH, KAESMAIER, RAINER, CZECH, GUENTHER
Year of Publication 21.03.2002
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Year of Publication 21.03.2002
Patent