Ultra-fast germanium photodiode with 3-dB bandwidth of 265 GHz
Lischke, S., Peczek, A., Morgan, J. S., Sun, K., Steckler, D., Yamamoto, Y., Korndörfer, F., Mai, C., Marschmeyer, S., Fraschke, M., Krüger, A., Beling, A., Zimmermann, L.
Published in Nature photonics (01.12.2021)
Published in Nature photonics (01.12.2021)
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Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene
Lukose, R., Lisker, M., Akhtar, F., Fraschke, M., Grabolla, T., Mai, A., Lukosius, M.
Published in Scientific reports (23.06.2021)
Published in Scientific reports (23.06.2021)
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Journal Article
Author Correction: Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene
Lukose, R., Lisker, M., Akhtar, F., Fraschke, M., Grabolla, T., Mai, A., Lukosius, M.
Published in Scientific reports (20.08.2021)
Published in Scientific reports (20.08.2021)
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Influence of Process Parameters on Surface Activated Aluminum-to-Aluminum Wafer Bonding
Schulze, Sebastian, Vob, T., Kruger, P., Fraschke, M., Kulse, P., Wietstruck, Matthias
Published in IEEE transactions on components, packaging, and manufacturing technology (2011) (01.03.2022)
Published in IEEE transactions on components, packaging, and manufacturing technology (2011) (01.03.2022)
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High performance metal–insulator–metal capacitors with atomic vapor deposited HfO2 dielectrics
Lukosius, M., Walczyk, Ch, Fraschke, M., Wolansky, D., Richter, H., Wenger, Ch
Published in Thin solid films (31.05.2010)
Published in Thin solid films (31.05.2010)
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Resistive switching characteristics of CMOS embedded HfO2-based 1T1R cells
WALCZYK, D, WALCZYK, Ch, SCHROEDER, T, BERTAUD, T, SOWINSKA, M, LUKOSIUS, M, FRASCHKE, M, TILLACK, B, WENGER, Ch
Published in Microelectronic engineering (01.07.2011)
Published in Microelectronic engineering (01.07.2011)
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Conference Proceeding
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Processing and integration of graphene in a 200 mm wafer Si technology environment
Lisker, M., Lukosius, M., Fraschke, M., Kitzmann, J., Dabrowski, J., Fursenko, O., Kulse, P., Schulz, K., Krüger, A., Drews, J., Schulze, S., Wolansky, D., Schubert, A.M., Katzer, J., Stolarek, D., Costina, I., Wolff, A., Dziallas, G., Coccetti, F., Mai, A.
Published in Microelectronic engineering (15.01.2019)
Published in Microelectronic engineering (15.01.2019)
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Crosstalk suppression of CMOS compatible AlN based SAW devices on low resistive Si(100)
Kaletta, Udo Ch, Wolansky, D., Wipf, M. Fraschke Ch, Wenger, Ch
Published in Physica status solidi. C (01.02.2014)
Published in Physica status solidi. C (01.02.2014)
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Gigahertz monolithic delay lines for surface acoustic waves on Silicon
Santos, P V, Rauwerdink, S, Biermann, K, Drescher, B, Seidel, W, Kaynak, M, Kaletta, U, Fraschke, M, Wolansky, D, Wenger, Ch
Published in IOP conference series. Materials Science and Engineering (01.01.2012)
Published in IOP conference series. Materials Science and Engineering (01.01.2012)
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Journal Article
Ge Photodiode with -3 dB OE Bandwidth of 110 GHz for PIC and ePIC Platforms
Lischke, S., Peczek, A., Korndorfer, F., Mai, C., Haisch, H., Koenigsmann, M., Rudisile, M., Steckler, D., Goetz, F., Fraschke, M., Marschmeyer, S., Kruger, A., Yamamoto, Y., Schmidt, D., Saarow, U., Heinrich, P., Kroh, A., Schubert, M. A., Katzer, J., Kulse, P., Trusch, A., Zimmermann, L.
Published in 2020 IEEE International Electron Devices Meeting (IEDM) (12.12.2020)
Published in 2020 IEEE International Electron Devices Meeting (IEDM) (12.12.2020)
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Conference Proceeding
Silicon nitride waveguide coupled 67+ GHz Ge photodiode for non-SOI PIC and ePIC platforms
Lischke, S., Fraschke, M., Richter, H., Kruger, A., Saarow, U., Heinrich, P., Winzer, G., Schulz, K., Kulse, P., Trusch, A., Zimmermann, L., Knoll, D., Mai, C., Hesse, A., Georgieva, G., Peczek, A., Kroh, A., Lisker, M., Schmidt, D.
Published in 2019 IEEE International Electron Devices Meeting (IEDM) (01.12.2019)
Published in 2019 IEEE International Electron Devices Meeting (IEDM) (01.12.2019)
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Conference Proceeding
Publisher Correction: Ultra-fast germanium photodiode with 3-dB bandwidth of 265 GHz
Lischke, S., Peczek, A., Morgan, J. S., Sun, K., Steckler, D., Yamamoto, Y., Korndörfer, F., Mai, C., Marschmeyer, S., Fraschke, M., Krüger, A., Beling, A., Zimmermann, L.
Published in Nature photonics (2022)
Published in Nature photonics (2022)
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Geometric conductive filament confinement by nanotips for resistive switching of HfO2-RRAM devices with high performance
Niu, Gang, Calka, Pauline, Auf der Maur, Matthias, Santoni, Francesco, Guha, Subhajit, Fraschke, Mirko, Hamoumou, Philippe, Gautier, Brice, Perez, Eduardo, Walczyk, Christian, Wenger, Christian, Di Carlo, Aldo, Alff, Lambert, Schroeder, Thomas
Published in Scientific reports (16.05.2016)
Published in Scientific reports (16.05.2016)
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High-performance photonic BiCMOS process for the fabrication of high-bandwidth electronic-photonic integrated circuits
Knoll, D., Lischke, S., Barth, R., Zimmermann, L., Heinemann, B., Rucker, H., Mai, C., Kroh, M., Peczek, A., Awny, A., Ulusoy, C., Trusch, A., Kruger, A., Drews, J., Fraschke, M., Schmidt, D., Lisker, M., Voigt, K., Krune, E., Mai, A.
Published in 2015 IEEE International Electron Devices Meeting (IEDM) (01.12.2015)
Published in 2015 IEEE International Electron Devices Meeting (IEDM) (01.12.2015)
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Conference Proceeding
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(Invited) Optimized HfO2-Based MIM Module Fabrication for Emerging Memory Applications
Mahadevaiah, Mamathamba Kalishettyhalli, Lisker, Marco, Fraschke, Mirko, Marschmeyer, Steffen, Schmidt, Detlef, Wenger, Christian, Perez, Eduardo, Mai, Andreas
Published in ECS transactions (03.07.2019)
Published in ECS transactions (03.07.2019)
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(Invited) Si1-xGex/Si MQW Based Uncooled Microbolometer Development and Integration into 130 nm BiCMOS Technology
Baristiran Kaynak, Canan, Yamamoto, Yuji, Göritz, Alexander, Korndoerfer, Falk, Zaumseil, Peter, Kulse, Philipp, Schulz, Katrin, Fraschke, Mirko, Marschmeyer, Steffen, Wolansky, Dirk, Wietstruck, Matthias, Shafique, Atia, Gurbuz, Yasar, Kaynak, Mehmet
Published in ECS transactions (01.01.2018)
Published in ECS transactions (01.01.2018)
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Journal Article
High performance metal–insulator–metal capacitors with atomic vapor deposited HfO 2 dielectrics
Lukosius, M., Walczyk, Ch, Fraschke, M., Wolansky, D., Richter, H., Wenger, Ch
Published in Thin solid films (2010)
Published in Thin solid films (2010)
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Journal Article
High performance metal-insulator-metal capacitors with atomic vapor deposited Hf02 dielectrics
LUKOSIUS, M, WALCZYK, Ch, FRASCHKE, M, WOLANSKY, D, RICHTER, H, WENGER, Ch
Published in Thin solid films (2010)
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Published in Thin solid films (2010)
Journal Article
Resistive switching characteristics of CMOS embedded HfO sub(2-based 1T1R cells)
Walczyk, D, Walczyk, Ch, Schroeder, T, Bertaud, T, Sowinska, M, Lukosius, M, Fraschke, M, Tillack, B, Wenger, Ch
Published in Microelectronic engineering (01.07.2011)
Published in Microelectronic engineering (01.07.2011)
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