Search Results - "FRANK SCHLESENER" :: K.UTB vyhledávací portál

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Apparatus and method for compensating defect of channel of microlithographic projection exposure system

by SAENGER INGO, SCHLESENER FRANK
Year of Publication 17.12.2014

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Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus

by Patra Michael, Schlesener Frank, Goehnermeier Aksel, Deguenther Markus, Saenger Ingo, Pazidis Alexandra, Dittmann Olaf, Schicketanz Thomas
Year of Publication 28.02.2017

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Illumination system for an EUV lithography device and facet mirror therefor

by Zimmermann Joerg, Ruoff Johannes, Schlesener Frank, Kraehmer Daniel, Saenger Ingo, Hennerkes Christoph
Year of Publication 24.01.2017

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METHOD AND APPARATUS FOR COMPENSATING AT LEAST ONE DEFECT OF AN OPTICAL SYSTEM

by DMITRIEV VLADIMIR, MENGEL MARKUS, SAENGER INGO, SCHLESENER FRANK, RUOFF JOHANNES
Year of Publication 27.11.2014

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Illumination optical unit for projection lithography

by Zimmermann Joerg, Ruoff Johannes, Schlesener Frank, Saenger Ingo, Hennerkes Christoph, Meier Martin
Year of Publication 29.11.2016

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Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure

by Zimmermann Joerg, Ruoff Johannes, Schlesener Frank, Saenger Ingo, Hennerkes Christoph, Meier Martin
Year of Publication 22.11.2016

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Illumination system of a microlithographic projection exposure apparatus

by Hoegele Wolfgang, Hilt Stefanie, Schlesener Frank, Davydenko Vladimir, Deguenther Markus, Korb Thomas
Year of Publication 22.11.2016

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Polarisationsmessvorrichtung für eine Projektionsbelichtungsanlage

by SÄNGER, INGO, SCHLESENER, FRANK
Year of Publication 24.07.2014

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Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren

by SAENGER, INGO, SCHLESENER, FRANK
Year of Publication 03.04.2014

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ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

by HILT STEFANIE, HOEGELE WOLFGANG, DEGUENTHER MARKUS, KORB THOMAS, SCHLESENER FRANK, DAVYDENKO VLADIMIR
Year of Publication 21.07.2016

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Optical beam splitter of polarization measurement device used in projection exposure system, has beam splitting surface for splitting incoming light beam reflected at beam splitting surface of beam portion and has curved form

by SAENGER, INGO, SCHLESENER, FRANK
Year of Publication 30.01.2014

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Optical system of a microlithographic projection exposure apparatus

by SAENGER, INGO, SCHLESENER, FRANK
Year of Publication 16.01.2014

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Illumination system of a microlithographic projection exposure apparatus

by HILT STEFANIE, HOEGELE WOLFGANG, DEGUENTHER MARKUS, KORB THOMAS, SCHLESENER FRANK, DAVYDENKO VLADIMIR
Year of Publication 12.04.2016

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Method for operating illumination system of microlithographic projection exposure apparatus

by NATT OLIVER, SCHLESENER FRANK
Year of Publication 27.11.2013

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Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system

by SAENGER, INGO, SCHLESENER, FRANK
Year of Publication 01.11.2013

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Optisches System einer mikrolithographischen Projektionsbelichtungsanlage

by SAENGER, INGO, SCHLESENER, FRANK
Year of Publication 17.10.2013

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Optisches System einer mikrolithographischen Projektionsbelichtungsanlage

by SAENGER, INGO, SCHLESENER, FRANK
Year of Publication 02.10.2013

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Optical system for microlithographic projection exposure system for manufacturing e.g. LCD, has lenses arranged such that angle of incidences of light beam with respect to optical axis at respective locations of lenses have opposite signs

by SAENGER, INGO, SCHLESENER, FRANK
Year of Publication 12.09.2013

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ILLUMINATION SYSTEM FOR AN EUV LITHOGRAPHY DEVICE AND FACET MIRROR THEREFOR

by SAENGER INGO, KRAEHMER DANIEL, ZIMMERMANN JOERG, RUOFF JOHANNES, SCHLESENER FRANK, HENNERKES CHRISTOPH
Year of Publication 07.01.2016

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$Optical system i.e. micro-lithographic projection exposure system, for manufacturing e.g. LCD, has lenses arranged relative to each other such that delay distribution is partly compensated by voltage-induced double refraction distribution$

Optical system i.e. micro-lithographic projection exposure system, for manufacturing e.g. LCD, has lenses arranged relative to each other such that delay distribution is partly compensated by voltage-induced double refraction distribution

by SAENGER, INGO, SCHLESENER, FRANK
Year of Publication 22.08.2013

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